Patents by Inventor Megumi Asaba

Megumi Asaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Exposure analyzing system, method for analyzing exposure condition, and method for manufacturing semiconductor device
    Publication number: 20060172207
    Abstract: An exposure analyzing system includes a microscope measuring CDs in resist patterns, each of the resist patterns being formed by specific defocus and dose conditions, an exposure condition calculator calculating functions of the specific defocus and dose conditions, each of the functions giving one of the CDs, an image arranger arranging images of the resist patterns in a matrix having a first coordinate axis arranging the defocus conditions and a second coordinate axis arranging the dose conditions, and a graphic controller displaying the images and the functions in a coordinate plane implemented by the first and second coordinate axes.
    Type: Application
    Filed: January 28, 2005
    Publication date: August 3, 2006
    Inventors: Megumi Asaba, Kenji Yoshida, Masatoshi Ueda, Shoji Mimotogi