Abstract: A sensor device comprises a quartz crystal microbalance (QCM) and a coating on at least a portion of a surface of the QCM, wherein the coating selectively reacts with radicals of a target gas and does not react with stable molecules of the target gas. The QCM is configured such that a resonant frequency of the QCM changes in response to reaction of the radicals of the target gas with the coating, wherein the change in the resonant frequency of the QCM correlates to an amount of the radicals of the target gas that have reacted with the coating.

Abstract: A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

Abstract: A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

Abstract: A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the outlet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.

Abstract: A substrate dry cleaning apparatus, a substrate dry cleaning system, and a method of cleaning a substrate are disclosed. The substrate dry cleaning system includes a substrate support and a reactive species generator. The reactive species generator includes a first conduit defining a first flow channel that extends to an outlet of the first conduit, the Gullet of the first conduit facing the substrate support, a first electrode, a second electrode facing the first electrode, the first flow channel disposed between the first electrode and the second electrode, a first inert wall disposed between the first electrode and the first flow channel, and a second inert wall disposed between the second electrode and the first flow channel.

Abstract: A nozzle for providing carbon dioxide for cleaning is disclosed. The nozzle includes a reservoir for receiving liquid carbon dioxide, a barrel defining a passageway therethrough, the passageway extending to an outlet of the barrel, an orifice effecting fluid communication between the reservoir and the passageway, and a screen member constructed and arranged for interrupting flow of the carbon dioxide pellets greater than a select size from being emitted from the passageway of the barrel. Liquid carbon dioxide flows through the orifice to phase transfer into gaseous carbon dioxide and carbon dioxide pellets in the passageway. An internal diameter of the passageway is smaller than an internal diameter of the reservoir.

Abstract: A nozzle and method of providing CO2 for cleaning includes providing a CO2 flow; phase transferring the CO2 flow into gaseous CO2 and CO2 pellets; interrupting the CO2 flow with a screen member; retaining the CO2 pellets of a select larger size upstream of the screen member; permitting the CO2 pellets of a select smaller size to pass through the screen member for cleaning.

Abstract: Methods for performing damage etch and texturing of single crystal silicon substrates, particularly for use as solar cells or photovoltaic cells. Damage etch with a TMAH solution followed by texturing using solution of KOH or NaOH mixed with IPA is particularly advantageous. The substitution of some of the IPA with ethylene glycol further improves results. Also disclosed is a process that combines both damage etch and texturing etch into a single step.

Abstract: A method for cleaning a substrate having organic and inorganic residues disposed thereon is provided. The method includes removing organic residue from the substrate using atmospheric oxygen plasma, and removing inorganic residue from the substrate using cryogenic CO2. The substrate may be pretreated using a benign cooling agent, and post-treated using a dilute wet chemical cleaning method.

Abstract: Methods for texturing of single crystal silicon substrates, particularly for use as solar cells or photovoltaic cells. Texturizing of the wafer surface is carried out with a TMAH based solution. The texturizing solution may further include isopropyl alcohol and ethylene glycol at different dilutions in DI water to further improves results.

Abstract: A nozzle and method of providing CO2 for cleaning includes providing a CO2 flow; phase transferring the CO2 flow into gaseous CO2 and CO2 pellets; interrupting the CO2 flow with a screen member; retaining the CO2 pellets of a select larger size upstream of the screen member; permitting the CO2 pellets of a select smaller size to pass through the screen member for cleaning.

Abstract: Methods for performing damage etch and texturing of single crystal silicon substrates, particularly for use as solar cells or photovoltaic cells. Damage etch with a TMAH solution followed by texturing using solution of KOH or NaOH mixed with IPA is particularly advantageous. The substitution of some of the IPA with ethylene glycol further improves results. Also disclosed is a process that combines both damage etch and texturing etch into a single step.

Abstract: This invention relates to an apparatus and method for integrated measurement of a sample that has miniature features. The apparatus has an optical measuring unit for illuminating the sample with a global test radiation over an optical test region and obtaining an optical response, such as scattered or transmitted radiation from the optical test region. In addition, the apparatus has a local measuring unit for making a nanometer scale measurement of a local material parameter ? of the sample. The local parameter ? is determined with a mechanical, optical, magnetic, electric or other physical measurement performed in the nanometer range with a scanning probe tip at a test location lying within the optical test region. The material parameter ? is selected such that it is substantially constant or uniform over the illuminated area.

Abstract: An apparatus and method for examining features of a sample with a broadband beam of light obtained from a long-wavelength source that may include two distinct emitters that emit a long-wavelength radiation and a short-wavelength source that emits a short-wavelength radiation. A passage is positioned between the sources and a reflective beam combining optics is provided for shaping the long-wavelength radiation to enter the short-wavelength source via the passage and also for shaping the short-wavelength radiation that exits through the passage and propagates toward the long-wavelength source. The reflective beam combining optics shape the short-wavelength radiation such that it re-enters the short-wavelength source via the passage and is combined with the long-wavelength radiation into the broadband beam that exits the short-wavelength source.

Abstract: Short-wavelength photons are used to ablate material from a low work function target onto a suitable substrate. The short-wavelength photons are at or below visible wavelength. The elemental composition of the deposit is controlled by the composition of the target and the gaseous environment in which the ablation process is performed. The process is carried out in a deposition chamber to which a short-wavelength laser is mounted and which includes a substrate holder which can be rotated, tilted, heated, or cooled. The target material is mounted onto a holder that spins the target during laser ablation. In addition, the deposition chamber is provided with a vacuum pump, an external gas supply with atomizer and radical generator, a gas generator for producing a flow of molecules on the substrate, and a substrate cleaning device, such as an ion gun. The substrate can be rotated and tilted, for example, whereby only the tip of an emitter can be coated with a low work function material.

Abstract: Mechanical properties (e.g. storage modulus and loss modulus), nanoscale dynamics (dynamic behavior of a material in the nanoscale) and structural properties (crystallographic orientation) imaging of material, ranging from biological to electronic materials are obtained by modification of conventional atomic force microscopy. The device and method allows for simultaneous topography and properties (mechanical, nanoscale dynamics, and structural) imaging both in liquid and dry conditions.

Abstract: A junction-based field emission display, wherein the junctions are formed by depositing a semiconducting or dielectric, low work function, negative electron affinity (NEA) silicon-based compound film (SBCF) onto a metal or n-type semiconductor substrate. The SBCF can be doped to become a p-type semiconductor. A small forward bias voltage is applied across the junction so that electron transport is from the substrate into the SBCF region. Upon entering into this NEA region, many electrons are released into the vacuum level above the SBCF surface and accelerated toward a positively biased phosphor screen anode, hence lighting up the phosphor screen for display. To turn off, simply switch off the applied potential across the SBCF/substrate. May be used for field emission flat panel displays.

Abstract: A junction-based field emission display, wherein the junctions are formed by depositing a semiconducting or dielectric, low work function, negative electron affinity (NEA) silicon-based compound film (SBCF) onto a metal or n-type semiconductor substrate. The SBCF can be doped to become a p-type semiconductor. A small forward bias voltage is applied across the junction so that electron transport is from the substrate into the SBCF region. Upon entering into this NEA region, many electrons are released into the vacuum level above the SBCF surface and accelerated toward a positively biased phosphor screen anode, hence lighting up the phosphor screen for display. To turn off, simply switch off the applied potential across the SBCF/substrate. May be used for field emission flat panel displays.

Abstract: Generation of low work function, stable compound thin films by laser ablation. Compound thin films with low work function can be synthesized by simultaneously laser ablating silicon, for example, and thermal evaporating an alkali metal into an oxygen environment. For example, the compound thin film may be composed of Si/Cs/O. The work functions of the thin films can be varied by changing the silicon/alkali metal/oxygen ratio. Low work functions of the compound thin films deposited on silicon substrates were confirmed by ultraviolet photoelectron spectroscopy (UPS). The compound thin films are stable up to 500° C. as measured by x-ray photoelectron spectroscopy (XPS). Tests have established that for certain chemical compositions and annealing temperatures of the compound thin films, negative electron affinity (NEA) was detected. The low work function, stable compound thin films can be utilized in solar cells, field emission flat panel displays, electron guns, and cold cathode electron guns.