Patents by Inventor Mehmet E. Yavuz

Mehmet E. Yavuz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Mask layout patterns for closely spaced primitives in phase shift photolithography masks
    Patent number: 9122169
    Abstract: Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed into primitives. Jogs are identified from among the primitives, the jogs being characterized by three adjacent corners. E-fields are determined for the identified jogs and are applied to synthesize an electric field at a substrate. The mask layout is corrected using the synthesized electric field and a printed wafer pattern is calculated.
    Type: Grant
    Filed: December 29, 2011
    Date of Patent: September 1, 2015
    Assignee: Intel Corporation
    Inventors: Bin Hu, Vivek K. Singh, Sungwon Kim, Chulwoo Oh, Mehmet E. Yavuz
  • MASK LAYOUT PATTERNS FOR CLOSELY SPACED PRIMITIVES IN PHASE SHIFT PHOTOLITHOGRAPHY MASKS
    Publication number: 20140302427
    Abstract: Improved mask layout patterns are described for closely spaced primitives in phase shift photolithography masks. In one example, at least a portion of a photolithography mask layout is decomposed into primitives. Jogs are identified from among the primitives, the jogs being characterized by three adjacent corners. E-fields are determined for the identified jogs and are applied to synthesize an electric field at a substrate. The mask layout is corrected using the synthesized electric field and a printed wafer pattern is calculated.
    Type: Application
    Filed: December 29, 2011
    Publication date: October 9, 2014
    Inventors: Bin Hu, Vivek K. Singh, Sungwon Kim, Chulwoo Oh, Mehmet E. Yavuz