Patents by Inventor Mehul CHAUHAN

Mehul CHAUHAN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Etch uniformity improvement for single turn internal coil PVD chamber
    Patent number: 12136544
    Abstract: Methods and apparatus for generating a magnetic field external to a physical vapor deposition (PVD) chamber to improve etch or deposition uniformity on a substrate disposed inside of the PVD chamber are provided herein. In some embodiments, a process chamber, includes a chamber body defining an interior volume therein; a pedestal disposed in the interior volume for supporting a substrate; a coil disposed in the interior volume above the pedestal; and an external magnet assembly, comprising: a housing coupled to the chamber body; and a plurality of magnets disposed external to the chamber body coupled to the housing and arranged asymmetrically about the chamber body.
    Type: Grant
    Filed: July 14, 2022
    Date of Patent: November 5, 2024
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Anthony Chih-Tung Chan, Adolph Miller Allen, Mehul Chauhan, Goichi Yoshidome
  • ETCH UNIFORMITY IMPROVEMENT FOR SINGLE TURN INTERNAL COIL PVD CHAMBER
    Publication number: 20230141298
    Abstract: Methods and apparatus for generating a magnetic field external to a physical vapor deposition (PVD) chamber to improve etch or deposition uniformity on a substrate disposed inside of the PVD chamber are provided herein. In some embodiments, a process chamber, includes a chamber body defining an interior volume therein; a pedestal disposed in the interior volume for supporting a substrate; a coil disposed in the interior volume above the pedestal; and an external magnet assembly, comprising: a housing coupled to the chamber body; and a plurality of magnets disposed external to the chamber body coupled to the housing and arranged asymmetrically about the chamber body.
    Type: Application
    Filed: July 14, 2022
    Publication date: May 11, 2023
    Inventors: Anthony Chih-Tung CHAN, Adolph Miller ALLEN, Mehul CHAUHAN