Patents by Inventor Mehul N. Patel
Mehul N. Patel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 12158698Abstract: Systems for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.Type: GrantFiled: October 21, 2021Date of Patent: December 3, 2024Assignee: Canon Kabushiki KaishaInventors: Amir Tavakkoli Kermani Ghariehali, Mehul N. Patel, Edward Brian Fletcher
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Patent number: 12136558Abstract: A base drop pattern (BDP) is generated based on at least one of input parameters. A segment required compensation volume (RCV) of edge segments near edges of the imprint field is estimated. Edge drop arrangements at the edge segments are generated based on the estimated segment RCV and a guide command from a user.Type: GrantFiled: June 30, 2022Date of Patent: November 5, 2024Assignee: CANON KABUSHIKI KAISHAInventors: Mehul N. Patel, Ahmed M. Hussein
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Publication number: 20240192612Abstract: A method for identifying pixels corresponding to an imprint field edge. Generating a set of pixel patterns, each pixel pattern from the set of pixel patterns including edge pixels predicted to be near the imprint field edge of a test imprint field and central pixels corresponding to a center portion of the test imprint field, wherein the edge pixels are turned on, each pixel pattern from the set of pixel patterns having different edge pixels selected and imprinting the test imprint field with a spatially modulated light source that is modulated with at least one pixel pattern from the set of pixel patterns.Type: ApplicationFiled: December 9, 2022Publication date: June 13, 2024Inventor: Mehul N. Patel
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Publication number: 20240006209Abstract: A base drop pattern (BDP) is generated based on at least one of input parameters. A segment required compensation volume (RCV) of edge segments near edges of the imprint field is estimated. Edge drop arrangements at the edge segments are generated based on the estimated segment RCV and a guide command from a user.Type: ApplicationFiled: June 30, 2022Publication date: January 4, 2024Inventors: Mehul N. Patel, Ahmed M. Hussein
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Patent number: 11768445Abstract: A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.Type: GrantFiled: August 20, 2021Date of Patent: September 26, 2023Assignee: CANON KABUSHIKI KAISHAInventors: James W. Irving, Mehul N. Patel
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Publication number: 20230205079Abstract: A system and method for generating a modulation map to be supplied a spatial light modulator of a nanoimprint lithography system. Receiving a pixelated intermediate map for a spatial light modulator including a plurality of pixels based on a distortion model and a target light pattern. The pixelated intermediate map may have discontinuities. Generating a modulation map for the spatial light modulator by filling in discontinuities in the pixelated intermediate map. A first predicted light intensity map produced by the modulation map may be a closer approximation of the target light pattern than a second predicted light intensity map produced by the pixelated intermediate map.Type: ApplicationFiled: December 23, 2021Publication date: June 29, 2023Inventors: Nilabh K. Roy, Mehul N. Patel
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Publication number: 20230053682Abstract: A formable material in contact with a template is irradiated to form a reference film using a predefined registration pattern associated with a spatial light modulator (SLM). The reference film is inspected to generate positional information of elements of the SLM relative to an imprint field edge. Positional offset of the elements of the SLM with respect to a holder of the template based on the positional information is determined. Control parameters for the SLM are determined based on the positional offset.Type: ApplicationFiled: August 20, 2021Publication date: February 23, 2023Inventors: James W. Irving, Mehul N. Patel
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Publication number: 20220043340Abstract: Systems for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.Type: ApplicationFiled: October 21, 2021Publication date: February 10, 2022Inventors: Amir Tavakkoli Kermani Ghariehali, Mehul N. Patel, Edward Brian Fletcher
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Patent number: 11181819Abstract: Systems and methods for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.Type: GrantFiled: May 31, 2019Date of Patent: November 23, 2021Assignee: CANON KABUSHIKI KAISHAInventors: Amir Tavakkoli Kermani Ghariehali, Mehul N. Patel, Edward Brian Fletcher
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Patent number: 11164302Abstract: Systems and processes for analyzing an image. Analyzing the image may comprise selecting a computer vision parameter for an image feature identification process. The image feature identification process may identify at least one feature in the image when using the computer vision parameter. Analyzing the image may further comprise segmenting the image into a region of interest T and a background region B. Analyzing the image may further comprise calculating a set of statistical values about the region of interest T of the image. Analyzing the image may further comprise classifying the image based on both the computer vision parameter and the set of statistical values as one of either: a defect containing image or a defect free image.Type: GrantFiled: August 8, 2019Date of Patent: November 2, 2021Assignee: CANON KABUSHIKI KAISHAInventors: Kathryn Brenda Bean, Teresa Perez Estrada, Edward Brian Fletcher, Mehul N. Patel
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Patent number: 10935885Abstract: Devices, systems, and methods position a template for imprinting a formable material over one or more gas-flow channels on a stage, wherein the template includes a patterning surface, a mesa, and at least one mesa sidewall; and direct a gas flow through the one or more gas-flow channels toward a portion of the at least one mesa sidewall.Type: GrantFiled: February 11, 2020Date of Patent: March 2, 2021Assignee: Canon Kabushiki KaishaInventors: Mehul N. Patel, Edward Brian Fletcher
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Publication number: 20210042906Abstract: Systems and processes for analyzing an image. Analyzing the image may comprise selecting a computer vision parameter for an image feature identification process. The image feature identification process may identify at least one feature in the image when using the computer vision parameter. Analyzing the image may further comprise segmenting the image into a region of interest T and a background region B. Analyzing the image may further comprise calculating a set of statistical values about the region of interest T of the image. Analyzing the image may further comprise classifying the image based on both the computer vision parameter and the set of statistical values as one of either: a defect containing image or a defect free image.Type: ApplicationFiled: August 8, 2019Publication date: February 11, 2021Inventors: Kathryn Brenda Bean, Teresa Perez Estrada, Edward Brian Fletcher, Mehul N. Patel
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Patent number: 10895806Abstract: A method, a system, and a controller for imprinting. Apply droplets of a formable material to imprint region of substrate. A partial pressure of formable material develops at a fluid-gas interface. A portion of an imprinting surface of a mesa on a template at an initial contact time is brought into contact with the droplets. The droplets merge and flow towards an imprint edge interface. A first gas flows in the imprint region prior to the initial contact time. A second gas flows into the imprint edge interface and region between the template and the substrate after the initial contact time. The template and the flow of the second gas reduces the partial pressure of the formable material below a vapor pressure of the formable material in a portion of the gap region adjacent to the fluid-gas interface at the imprint edge interface.Type: GrantFiled: August 21, 2018Date of Patent: January 19, 2021Assignee: Canon Kabushiki KaishaInventors: Mehul N. Patel, Edward Brian Fletcher, Seth J. Bamesberger, Alireza Aghili
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Publication number: 20200379342Abstract: Systems and methods for shaping a film by: depositing a formable material on a field of a substrate; and positioning a template relative to the field. The template has a mesa with a shaping surface and mesa sidewalls surround the shaping surface. The shaping may further comprise contacting the formable material with the shaping surface. The formable material may spread when the shaping surface is in contact with the formable material. The shaping may comprise exposing the formable material to a curing dose of actinic radiation after the formable material has spread to the edge of the field. A spatial distribution of the curing dose may be such that an interior dose applied at an interior of the field may be greater than a sidewall dose that is incident on the mesa sidewalls.Type: ApplicationFiled: May 31, 2019Publication date: December 3, 2020Inventors: Amir Tavakkoli Kermani Ghariehali, Mehul N. Patel, Edward Brian Fletcher
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Publication number: 20190101823Abstract: A method, a system, and a controller for imprinting. Apply droplets of a formable material to imprint region of substrate. A partial pressure of formable material develops at a fluid-gas interface. A portion of an imprinting surface of a mesa on a template at an initial contact time is brought into contact with the droplets. The droplets merge and flow towards an imprint edge interface. A first gas flows in the imprint region prior to the initial contact time. A second gas flows into the imprint edge interface and region between the template and the substrate after the initial contact time. The template and the flow of the second gas reduces the partial pressure of the formable material below a vapor pressure of the formable material in a portion of the gap region adjacent to the fluid-gas interface at the imprint edge interface.Type: ApplicationFiled: August 21, 2018Publication date: April 4, 2019Inventors: Mehul N. Patel, Edward Brian Fletcher, Seth J. Bamesberger, Alireza Aghili
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Publication number: 20170073815Abstract: A method for depositing metal or metal alloy on a substrate includes preparing a mixture including a hydroxide, a polyol solvent, a metal precursor and a complexing agent, wherein the mixture does not include water; applying the mixture to a substrate including exposed metal surfaces to selectively deposit metal onto the exposed metal surfaces of the substrate; and heating the mixture to a predetermined deposition temperature range from 120° C. and 160° C. at least one of before or after applying the mixture to the substrate.Type: ApplicationFiled: September 10, 2015Publication date: March 16, 2017Inventors: Mehul N. Patel, Diane Hymes, Yezdi Dordi, Aniruddha Joi