Patents by Inventor Mei-Li Wang

Mei-Li Wang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20220050375
    Abstract: An overlay pattern includes a light-transmitting region and a first light-proof region. The first light-proof region and the light-transmitting region are arranged on a same plane, and an area of the first light-proof region is larger than an area of the light-transmitting region. An orthographic projection of the first light-proof region on the plane and an orthographic projection of the light-transmitting region on the plane do not overlap and form a first rectangular region.
    Type: Application
    Filed: August 18, 2021
    Publication date: February 17, 2022
    Inventor: MEI-LI WANG
  • Publication number: 20210333706
    Abstract: The present disclosure provides a mask and a method for testing a quality of the mask, the mask includes a mask exposure region and a region other than mask exposure region. The mask exposure region is provided with a mask pattern. The region other than mask exposure region is provided with a test area. The test area includes at least one test mark. A deviation between a design size and an actual size of the each test mark is used to determine the quality of the mask.
    Type: Application
    Filed: July 9, 2021
    Publication date: October 28, 2021
    Inventor: Mei-Li Wang
  • Publication number: 20210280563
    Abstract: A semiconductor device is disclosed. The device includes a stacked structure and an electrode. The stacked structure includes at least one die, the electrode is located on a side surface of the stacked structure, and the electrode has a length greater than or equal to a thickness of the die in a thickness direction of the die. The semiconductor device does not need a micro-bump for connection, thereby allowing a thinner stacked structure. The electrodes are disposed on the side surface of the stacked structure. Thus, it is not necessary to provide a connection at the wiring layer or reserve connection position when designing the circuit. The length of the electrode in the thickness direction of the die is greater than or equal to the thickness of the die, facilitating the connection of circuits on a plurality of dies.
    Type: Application
    Filed: May 24, 2021
    Publication date: September 9, 2021
    Inventors: Ping-Heng WU, Mei-Li WANG
  • Patent number: 10243099
    Abstract: A semiconductor device comprises a substrate comprising a surface area having a plurality of patterns therein, wherein the plurality of patterns comprises a plurality of first patterns and a plurality of second patterns; and a light-emitting stack formed on the substrate; wherein each of the first patterns comprises a first feature length and each of the second patterns comprises a second feature length smaller than the first feature length, and wherein, in a square area of 30 microns by 30 microns chosen from the surface area, an amount of the plurality of the first patterns is more than that of the plurality of the second patterns.
    Type: Grant
    Filed: May 16, 2017
    Date of Patent: March 26, 2019
    Assignees: Epistar Corporation, Asahi Kasei Corporation
    Inventors: Jennhwa Fu, Hsin-Hsiung Huang, Mei-Li Wang
  • Publication number: 20180337304
    Abstract: A semiconductor device comprises a substrate comprising a surface area having a plurality of patterns therein, wherein the plurality of patterns comprises a plurality of first patterns and a plurality of second patterns; and a light-emitting stack formed on the substrate; wherein each of the first patterns comprises a first feature length and each of the second patterns comprises a second feature length smaller than the first feature length, and wherein, in a square area of 30 microns by 30 microns chosen from the surface area, an amount of the plurality of the first patterns is more than that of the plurality of the second patterns.
    Type: Application
    Filed: May 16, 2017
    Publication date: November 22, 2018
    Inventors: Jennhwa FU, Hsin-Hsiung HUANG, Mei-Li WANG
  • Patent number: 9199430
    Abstract: Disclosed is a stitched-together textile and plastic component including an upper transparent plastic layer, a lower transparent plastic layer and a textile layer.
    Type: Grant
    Filed: May 9, 2014
    Date of Patent: December 1, 2015
    Inventor: Mei-Li Wang
  • Publication number: 20150251379
    Abstract: Disclosed is a stitching-to-combined component of textile and plastic including an upper transparent plastic layer, a lower transparent plastic layer and a textile layer. The textile layer is stacked between the upper transparent plastic layer and the lower transparent plastic layer, wherein the lower transparent plastic layer is stitching-to-combined with the textile layer and/or with both the textile layer and the upper transparent plastic layer by means of a decorative stitch to form a sewing pattern, by which the characteristics of the upper and lower transparent plastic layers such as waterproofing, antifouling, rigidity and durability are combined with the various texture of the textile layer to applied in the manufacturing of everyday items. In addition, with the rigidity of the upper and lower transparent plastic layers, a lighter textile such as gauze or lace can be used selectively in the manufacturing of bags.
    Type: Application
    Filed: May 9, 2014
    Publication date: September 10, 2015
    Inventor: Mei-Li Wang
  • Patent number: 8347673
    Abstract: A code lock is revealed. The code lock includes a housing, a return base, a plurality of locking seats, a fixed seat, a moveable seat, a code seat, a plurality of code members and a housing base arranged sequentially from top to bottom. A press button corresponding to each locking seat is disposed on the housing and each locking seat has at least one tooth that locks with a hook of the return base when the press button is pressed to push the locking seat. A stopping block is arranged at the bottom of each locking seat while the code member is set with a code post correspondingly. Moreover, the moveable seat includes a code area and a non-code area for mounting the code member and the code seat has a plurality of C-shaped holes corresponding to the code members. Thereby a simple-structured and easy-operated code lock is formed.
    Type: Grant
    Filed: November 16, 2009
    Date of Patent: January 8, 2013
    Inventors: Sung-Ming Wang, Mei-Li Wang
  • Publication number: 20110113839
    Abstract: A code lock is revealed. The code lock includes a housing, a return base, a plurality of locking seats, a fixed seat, a moveable seat, a code seat, a plurality of code members and a housing base arranged sequentially from top to bottom. A press button corresponding to each locking seat is disposed on the housing and each locking seat has at least one tooth that locks with a hook of the return base when the press button is pressed to push the locking seat. A stopping block is arranged at the bottom of each locking seat while the code member is set with a code post correspondingly. Moreover, the moveable seat includes a code area and a non-code area for mounting the code member and the code seat has a plurality of C-shaped holes corresponding to the code members. Thereby a simple-structured and easy-operated code lock is formed.
    Type: Application
    Filed: November 16, 2009
    Publication date: May 19, 2011
    Inventors: Sung-Ming Wang, Mei-Li Wang
  • Patent number: 7651824
    Abstract: A method for compensating critical dimension (CD) variations of patterns of a substrate, by the correcting the CD of the corresponding photomask is disclosed. First, a light and a main photomask are provided. Second, an auxiliary photomask including an auxiliary transparent substrate and a shading element within the auxiliary transparent substrate is provided. Next the light passes through the auxiliary photomask and main photomask in order for compensating CD variations of patterns corresponding to main photomask.
    Type: Grant
    Filed: December 7, 2008
    Date of Patent: January 26, 2010
    Assignee: Nanya Technology Corp.
    Inventors: Hsuan-Ko Chen, Mei-Li Wang, Chih-Cheng Chin, Pei-Cheng Fan