Patents by Inventor Mei-Tsu LAI

Mei-Tsu LAI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photomask purging system and method
    Patent number: 10871722
    Abstract: A photomask purging method includes opening a pod having a photomask therein, gripping the photomask by an end effector, moving the end effector from the opened pod to a destination where a gas exit is toward, exhausting a gas from the gas exit toward the gripped photomask, and rotating the end effector with respect to a horizontal plane when the end effector is at the destination where the gas exit is toward.
    Type: Grant
    Filed: November 26, 2018
    Date of Patent: December 22, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chung-Yi Yen, Mei-Tsu Lai, Chen-Hung Lin, Chien-Chou Ke, You-Cheng Yeh, Tai-Hsiang Lin
  • PHOTOMASK PURGING SYSTEM AND METHOD
    Publication number: 20200019075
    Abstract: A photomask purging method includes opening a pod having a photomask therein, gripping the photomask by an end effector, moving the end effector from the opened pod to a destination where a gas exit is toward, exhausting a gas from the gas exit toward the gripped photomask, and rotating the end effector with respect to a horizontal plane when the end effector is at the destination where the gas exit is toward.
    Type: Application
    Filed: November 26, 2018
    Publication date: January 16, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chung-Yi YEN, Mei-Tsu LAI, Chen-Hung LIN, Chien-Chou KE, You-Cheng YEH, Tai-Hsiang LIN