Patents by Inventor Meir VENGROVER

Meir VENGROVER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Generating a metrology recipe usable for examination of a semiconductor specimen
    Patent number: 11443420
    Abstract: There is provided a system and method of generating a metrology recipe usable for examining a semiconductor specimen, comprising: obtaining a first image set comprising a plurality of first images captured by an examination tool, obtaining a second image set comprising a plurality of second images, wherein each second image is simulated based on at least one first image, wherein each second image is associated with ground truth data; performing a first test on the first image set and a second test on the second image set in accordance with a metrology recipe configured with a first parameter set, and determining, in response to a predetermined criterion not being met, to select a second parameter set, configure the metrology recipe with the second parameter set, and repeat the first test and the second test in accordance with the metrology recipe configured with the second parameter set.
    Type: Grant
    Filed: December 28, 2020
    Date of Patent: September 13, 2022
    Assignee: Applied Materials Israel Ltd.
    Inventors: Roman Kris, Grigory Klebanov, Einat Frishman, Tal Orenstein, Meir Vengrover, Noa Marom, Ilan Ben-Harush, Rafael Bistritzer, Sharon Duvdevani-Bar
  • GENERATING A METROLOGY RECIPE USABLE FOR EXAMINATION OF A SEMICONDUCTOR SPECIMEN
    Publication number: 20220207681
    Abstract: There is provided a system and method of generating a metrology recipe usable for examining a semiconductor specimen, comprising: obtaining a first image set comprising a plurality of first images captured by an examination tool, obtaining a second image set comprising a plurality of second images, wherein each second image is simulated based on at least one first image, wherein each second image is associated with ground truth data; performing a first test on the first image set and a second test on the second image set in accordance with a metrology recipe configured with a first parameter set, and determining, in response to a predetermined criterion not being met, to select a second parameter set, configure the metrology recipe with the second parameter set, and repeat the first test and the second test in accordance with the metrology recipe configured with the second parameter set.
    Type: Application
    Filed: December 28, 2020
    Publication date: June 30, 2022
    Inventors: Roman KRIS, Grigory KLEBANOV, Einat FRISHMAN, Tal ORENSTEIN, Meir VENGROVER, Noa MAROM, Ilan BEN-HARUSH, Rafael BISTRITZER, Sharon DUVDEVANI-BAR