Patents by Inventor Meko McCray

Meko McCray has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photopatternable materials and related electronic devices and methods
    Patent number: 9704997
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Grant
    Filed: November 16, 2015
    Date of Patent: July 11, 2017
    Assignee: Flexterra, Inc.
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Minhuei Wang, Meko McCray, Yu Xia, Antonio Facchetti
  • Photopatternable Materials and Related Electronic Devices and Methods
    Publication number: 20160190337
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Application
    Filed: November 16, 2015
    Publication date: June 30, 2016
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Minhuei Wang, Meko McCray, Yu Xia, Antonio Facchetti
  • Photopatternable materials and related electronic devices and methods
    Patent number: 9341948
    Abstract: Described herein is a solution-processable composition for preparing a photopatternable material. The solution-processable composition generally includes (a) an oligomeric siloxane component that includes, based on its total weight, between about 40% by weight and about 100% by weight one or more cage-structured polyhedral oligomeric silsesquioxanes that are functionalized with one or more crosslinkable moieties such as cycloaliphatic epoxy moieties, (b) a polymerization initiator; (c) one or more thermosettable polymers that collectively are present in an amount between about 1% by weight and about 20% by weight based on the total weight of the oligomeric siloxane component; and (d) a solvent.
    Type: Grant
    Filed: August 25, 2014
    Date of Patent: May 17, 2016
    Assignee: Polyera Corporation
    Inventors: Chun Huang, Zhikai Wang, Yu Xia, Meko McCray, Theresa L. Starck, Darwin Scott Bull, Antonio Facchetti, Xiang Yu
  • Photopatternable materials and related electronic devices and methods
    Patent number: 9190493
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Grant
    Filed: July 15, 2014
    Date of Patent: November 17, 2015
    Assignee: Polyera Corporation
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Minhuei Wang, Meko McCray, Yu Xia, Antonio Facchetti
  • Photopatternable Materials and Related Electronic Devices and Methods
    Publication number: 20150056553
    Abstract: The present inorganic-organic hybrid materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. The present materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Application
    Filed: August 25, 2014
    Publication date: February 26, 2015
    Inventors: Chun Huang, Zhikai Wang, Yu Xia, Meko McCray, Theresa L. Starck, Darwin Scott Bull, Antonio Facchetti, Xiang Yu
  • Photopatternable Materials and Related Electronic Devices and Methods
    Publication number: 20150021597
    Abstract: The present polymeric materials can be patterned with relatively low photo-exposure energies and are thermally stable, mechanically robust, resist water penetration, and show good adhesion to metal oxides, metals, metal alloys, as well as organic materials. In addition, these polymeric materials can be solution-processed (e.g., by spin-coating), and can exhibit good chemical (e.g., solvent and etchant) resistance in the cured form.
    Type: Application
    Filed: July 15, 2014
    Publication date: January 22, 2015
    Inventors: Shaofeng Lu, Daniel Batzel, Chun Huang, Ming Huei Wang, Meko McCray, Yu Xia, Antonio Facchetti