Abstract: A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formula wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, alpha olefin and diene, each M is independently H, Ca, Mg, Al, Na, or K, each R1 is independently H, C1-C6 alkyl, or C1-C6 hydroxyalkyl, each R2 is independently linear or branched C1-C12 alkyl, C1-C6 hydroxyalkyl, C6F5, arylalkyl, C6H4OH, R3COOH, or R3SO3H, or R1 and R2 are linked together to form a morpholino or pyrrolidino ring, R3 is linear or branched C1-C12 alkyl, CH(COOH)CH2CH2, C6H4, or C6H3(OH), h1+h2 is h, h is a positive integer, k is zero or a positive integer, i and j are each independently zero or a positive integer, provided that the total of 1) h÷(k+h+i+j) is from about 0.005 to about 0.7, 2) k÷(k+h+i+j) is from about 0.3 to about 0.6, 3) [i+j]÷(k+h+i+j) is 0 to about 0.6, and provided that the sum of 1)+2)+3) is 1.

Abstract: A composition which provides stain resistance and soil resistance to substrates comprising a copolymer of Formula 1 is disclosed, wherein D, M, R, Rf, x, k, h, i and j are defined as in claim 1.

Abstract: A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formula wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, alpha olefin and diene, each M is independently H, Ca, Mg, Al, Na, or K, each R1 is independently H, C1-C6 alkyl, or C1-C6 hydroxyalkyl, each R2 is independently linear or branched C1-C12 alkyl, C1-C6 hydroxyalkyl, C6F5, arylalkyl, C6H4OH, R3COOH, or R3SO3H, or R1 and R2 are linked together to form a morpholino or pyrrolidino ring, R3 is linear or branched C1-C12 alkyl, CH(COOH)CH2CH2, C6H4, or C6H3(OH), h1+h2 is h, h is a positive integer, k is zero or a positive integer, i and j are each independently zero or a positive integer, provided that the total of 1) h÷(k+h+i+j) is from about 0.005 to about 0.7, 2) k÷(k+h+i+j) is from about 0.3 to about 0.6, 3) [i+j]÷(k+h+i+j) is 0 to about 0.6, and provided that the sum of 1)+2)+3) is 1.

Abstract: A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formula wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, alpha olefin and diene, each M is independently H, Ca, Mg, Al, Na, or K, each R1 is independently H, C1-C6 alkyl, or C1-C6 hydroxyalkyl, each R2 is independently linear or branched C1-C12 alkyl, C1-C6 hydroxyalkyl, C6F5, arylalkyl, C6H4OH, R3COOH, or R3SO3H, or R1 and R2 are linked together to form a morpholino or pyrrolidino ring, R3 is linear or branched C1-C12 alkyl, CH(COOH)CH2CH2, C6H4, or C6H3(OH), h1+h2 is h, h is a positive integer, k is zero or a positive integer, i and j are each independently zero or a positive integer, provided that the total of 1) h÷(k+h+i+j) is from about 0.005 to about 0.7, 2) k÷(k+h+i+j) is from about 0.3 to about 0.6, 3) [i+j]÷(k+h+i+j) is 0 to about 0.6, and provided that the sum of 1)+2)+3) is 1.

Abstract: A composition which provides stain resistance and soil resistance to substrates comprising a copolymer of Formula 1 wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, vinyl ether, allyl ether, alpha olefin and diene; each M is independently H, NH4, Ca, Mg, Al, or a Group I metal; R is H, a C1-C16 alkyl group, or an arylalkyl group; Rf is a fully fluorinated straight or branched C2 to C20 aliphatic radical, or mixture thereof, which is optionally interrupted by at least one oxygen atom; x is 1 to about 10, or a mixture thereof; k and h are each independently a positive integer; i and j are each independently zero or a positive integer, provided that i and j are not both simultaneously zero; the molar ratio of k to (h+i+j) is from about 3:1 to about 1:3, and the molar ratio of h to (i+j) is from about 1:99 to about 22:78 is disclosed.

Abstract: A composition for use as a stain blocker and a method of treating substrates therewith, said composition comprising a polymer of Formula 1 having the following repeating units in random sequence wherein R1 is H, methyl or ethyl; R2 and R3 are each independently H, C1 to about C10 alkyl, —COOR4, CONR5R6, or —CN; R4 is M, C1 to about C20 alkyl, or C6 to C10 aryl; R5 and R6 are each independently H, C1 to C10 alkyl, C6 to C10 aryl, or R5 and R6 together with the nitrogen atom form a morpholine, pyrrolidine, or piperidine ring; R7 is a C4 to C8 alkyl group; M is H, an alkali metal or alkali earth metal; h is about 10 to 100 mole %; i is 0 to about 80 mole %; j is 0 to about 60 mole %; k and n are each independently 0 to about 40 mole %; and m is 0.01 to about 0.5; provided that h+i+j+k+n equals 100, and provided that i+j+k+n is greater than zero, except when h is 100%.

Abstract: A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formula wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, alpha olefin and diene, each M is independently H, Ca, Mg, Al, Na, or K, each R1 is independently H, C1-C6 alkyl, or C1-C6 hydroxyalkyl, each R2 is independently linear or branched C1-C12 alkyl, C1-C6 hydroxyalkyl, C6F5, arylalkyl, C6H4OH, R3COOH, or R3SO3H, or R1 and R2 are linked together to form a morpholino or pyrrolidino ring, R3 is linear or branched C1-C12 alkyl, CH(COOH)CH2CH2, C6H4, or C6H3(OH), h1+h2 is h, h is a positive integer, k is zero or a positive integer, i and j are each independently zero or a positive integer, provided that the total of 1) h÷(k+h+i+j) is from about 0.005 to about 0.7, 2) k÷(k+h+i+j) is from about 0.3 to about 0.6, 3) [i+j]÷(k+h+i+j) is 0 to about 0.6, and provided that the sum of 1)+2)+3) is 1.

Abstract: A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formula wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, alpha olefin and diene, each M is independently H, Ca, Mg, Al, Na, or K, each R1 is independently H, C1-C6 alkyl, or C1-C6 hydroxyalkyl, each R2 is independently linear or branched C1-C12 alkyl, C1-C6 hydroxyalkyl, C6F5, arylalkyl, C6H4OH, R3COOH, or R3SO3H, or R1 and R2 are linked together to form a morpholino or pyrrolidino ring, R3 is linear or branched C1-C12 alkyl, CH(COOH)CH2CH2, C6H4, or C6H3(OH), h1+h2 is h, h is a positive integer, k is zero or a positive integer, i and j are each independently zero or a positive integer, provided that the total of 1) h÷(k+h+i+j) is from about 0.005 to about 0.7, 2) k÷(k+h+i+j) is from about 0.3 to about 0.6, 3) [i+j]÷(k+h+i+j) is 0 to about 0.6, and provided that the sum of 1)+2)+3) is 1.

Abstract: A method for imparting resistance to staining to a substrate comprising contacting the substrate with a copolymer comprising the monomers of Formula wherein D is at least one vinyl monomer selected from the group consisting of aryl olefin, alpha olefin and diene, each M is independently H, Ca, Mg, Al, Na, or K, each R1 is independently H, C1-C6 alkyl, or C1-C6 hydroxyalkyl, each R2 is independently linear or branched C1-C12 alkyl, C1-C6 hydroxyalkyl, C6F5, arylalkyl, C6H4OH, R3COOH, or R3SO3H, or R1 and R2 are linked together to form a morpholino or pyrrolidino ring, R3 is linear or branched C1-C12 alkyl, CH(COOH)CH2CH2, C6H4, or C6H3(OH), h1+h2 is h, h is a positive integer, k is zero or a positive integer, i and j are each independently zero or a positive integer, provided that the total of 1) h÷(k+h+i+j) is from about 0.005 to about 0.7, 2) k÷(k+h+i+j) is from about 0.3 to about 0.6, 3) [i+j]÷(k+h+i+j) is 0 to about 0.6, and provided that the sum of 1)+2)+3) is 1.