Patents by Inventor Melik C. Demirel

Melik C. Demirel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9845409
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: December 19, 2017
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Patent number: 9840638
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: December 12, 2017
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Patent number: 9701865
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: July 26, 2016
    Date of Patent: July 11, 2017
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Publication number: 20170029659
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Application
    Filed: July 26, 2016
    Publication date: February 2, 2017
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Publication number: 20170029658
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Application
    Filed: July 26, 2016
    Publication date: February 2, 2017
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Publication number: 20160333139
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Application
    Filed: July 26, 2016
    Publication date: November 17, 2016
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel
  • Patent number: 9422448
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: September 5, 2013
    Date of Patent: August 23, 2016
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J Dressick, Melik C. Demirel, Alok Singh
  • Patent number: 8652632
    Abstract: Disclosed herein is a structure having a spatially organized polymer nanostructured thin film and a metal coating on the film. The thin film is made by directing a monomer vapor or pyrolyzed monomer vapor towards a substrate at an angle other than perpendicular to the substrate, and polymerizing the monomer or pyrolyzed monomer on the substrate.
    Type: Grant
    Filed: June 3, 2009
    Date of Patent: February 18, 2014
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Melik C. Demirel, Walter J. Dressick, David Allara
  • Patent number: 8647654
    Abstract: A method of forming a sculptured thin film on a surface includes rotating the surface and depositing a sculptured thin film comprised of a polymer on the surface to form submicron or nanoscale wires during the step of rotating. The submicron wires may be columnar, helically columnar, chevron shaped, chiral shaped, distinct or interwoven. The depositing step may involve pyrolizing the polymer into a vapor of monomers, directing the vapor of monomers towards the surface while rotating the surface, and polymerizing the monomers on the surface. The surface may be incorporated into biomedical device or other biological application where the sculptured thin film is biocompatible and bioactive and adapted for a biological use.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: February 11, 2014
    Assignee: The Penn State Research Foundation
    Inventors: Melik C. Demirel, Akhlesh Lakhtakia
  • Publication number: 20140011023
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured polyp-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Application
    Filed: September 5, 2013
    Publication date: January 9, 2014
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel, Alok Singh
  • Patent number: 8603623
    Abstract: A spatially organized polymer nanostructured thin film and a ligand adsorbate attached to the polymer nanostructured thin film and, optionally, an additional material or materials attached to the ligand adsorbate. A method for forming a structure by: providing a spatially organized polymer nanostructured thin film and a ligand adsorbate, and adsorbing the ligand adsorbate onto the thin film and, optionally, binding additional material or materials to the ligand adsorbate.
    Type: Grant
    Filed: April 24, 2008
    Date of Patent: December 10, 2013
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Melik C. Demirel, Alok K Singh, Walter J Dressick
  • Patent number: 8535805
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Grant
    Filed: April 28, 2009
    Date of Patent: September 17, 2013
    Assignee: The United States of America, as represented by the Secretary of the Navy
    Inventors: Melik C. Demirel, Walter J Dressick, Alok Singh
  • Publication number: 20090269587
    Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.
    Type: Application
    Filed: April 28, 2009
    Publication date: October 29, 2009
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Walter J. Dressick, Melik C. Demirel, Alok Singh
  • Publication number: 20090257056
    Abstract: Disclosed herein is a structure having a spatially organized polymer nanostructured thin film and a metal coating on the film. The thin film is made by directing a monomer vapor or pyrolyzed monomer vapor towards a substrate at an angle other than perpendicular to the substrate, and polymerizing the monomer or pyrolyzed monomer on the substrate.
    Type: Application
    Filed: June 3, 2009
    Publication date: October 15, 2009
    Applicant: The Government of the United States of America, as represented by the Secretary of the Navy
    Inventors: Melik C. Demirel, Walter J. Dressick, David Allara
  • Publication number: 20080268226
    Abstract: A spatially organized polymer nanostructured thin film and a ligand adsorbate attached to the polymer nanostructured thin film and, optionally, an additional material or materials attached to the ligand adsorbate. A method for forming a structure by: providing a spatially organized polymer nanostructured thin film and a ligand adsorbate, and adsorbing the ligand adsorbate onto the thin film and, optionally, binding additional material or materials to the ligand adsorbate.
    Type: Application
    Filed: April 24, 2008
    Publication date: October 30, 2008
    Applicant: Naval Research Laboratory
    Inventors: Melik C. Demirel, Alok K Singh, Walter J. Dressick