Patents by Inventor Melik C. Demirel
Melik C. Demirel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9845409Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: July 26, 2016Date of Patent: December 19, 2017Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
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Patent number: 9840638Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: July 26, 2016Date of Patent: December 12, 2017Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
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Patent number: 9701865Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: July 26, 2016Date of Patent: July 11, 2017Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
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Publication number: 20170029659Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: ApplicationFiled: July 26, 2016Publication date: February 2, 2017Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
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Publication number: 20170029658Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: ApplicationFiled: July 26, 2016Publication date: February 2, 2017Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
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Publication number: 20160333139Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: ApplicationFiled: July 26, 2016Publication date: November 17, 2016Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel
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Patent number: 9422448Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: September 5, 2013Date of Patent: August 23, 2016Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Walter J Dressick, Melik C. Demirel, Alok Singh
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Patent number: 8652632Abstract: Disclosed herein is a structure having a spatially organized polymer nanostructured thin film and a metal coating on the film. The thin film is made by directing a monomer vapor or pyrolyzed monomer vapor towards a substrate at an angle other than perpendicular to the substrate, and polymerizing the monomer or pyrolyzed monomer on the substrate.Type: GrantFiled: June 3, 2009Date of Patent: February 18, 2014Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Melik C. Demirel, Walter J. Dressick, David Allara
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Patent number: 8647654Abstract: A method of forming a sculptured thin film on a surface includes rotating the surface and depositing a sculptured thin film comprised of a polymer on the surface to form submicron or nanoscale wires during the step of rotating. The submicron wires may be columnar, helically columnar, chevron shaped, chiral shaped, distinct or interwoven. The depositing step may involve pyrolizing the polymer into a vapor of monomers, directing the vapor of monomers towards the surface while rotating the surface, and polymerizing the monomers on the surface. The surface may be incorporated into biomedical device or other biological application where the sculptured thin film is biocompatible and bioactive and adapted for a biological use.Type: GrantFiled: December 15, 2006Date of Patent: February 11, 2014Assignee: The Penn State Research FoundationInventors: Melik C. Demirel, Akhlesh Lakhtakia
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Publication number: 20140011023Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured polyp-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: ApplicationFiled: September 5, 2013Publication date: January 9, 2014Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel, Alok Singh
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Patent number: 8603623Abstract: A spatially organized polymer nanostructured thin film and a ligand adsorbate attached to the polymer nanostructured thin film and, optionally, an additional material or materials attached to the ligand adsorbate. A method for forming a structure by: providing a spatially organized polymer nanostructured thin film and a ligand adsorbate, and adsorbing the ligand adsorbate onto the thin film and, optionally, binding additional material or materials to the ligand adsorbate.Type: GrantFiled: April 24, 2008Date of Patent: December 10, 2013Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Melik C. Demirel, Alok K Singh, Walter J Dressick
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Patent number: 8535805Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: GrantFiled: April 28, 2009Date of Patent: September 17, 2013Assignee: The United States of America, as represented by the Secretary of the NavyInventors: Melik C. Demirel, Walter J Dressick, Alok Singh
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Publication number: 20090269587Abstract: Provided herein are the polymers shown below. The value n is a positive integer. R1 is an organic group, and each R2 is H or a chemisorbed group, with at least one R2 being a chemisorbed group. The polymer may be a nanostructured film. Also provided herein is a method of: converting a di-p-xylylene paracyclophane dimer to a reactive vapor of monomers; depositing the reactive vapor onto a substrate held at an angle relative to the vapor flux to form nanostructured poly(p-xylylene) film; reacting the film with an agent to form hydrogen atoms that are reactive with a precursor of a chemisorbed group, if the film does not contain the hydrogen atoms; and reacting the hydrogen atoms with the precursor. Also provided herein is a device having a nanostructured poly(p-xylylene) film on a pivotable substrate. The film has directional hydrophobic or oleophobic properties and directional adhesive properties.Type: ApplicationFiled: April 28, 2009Publication date: October 29, 2009Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Walter J. Dressick, Melik C. Demirel, Alok Singh
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Publication number: 20090257056Abstract: Disclosed herein is a structure having a spatially organized polymer nanostructured thin film and a metal coating on the film. The thin film is made by directing a monomer vapor or pyrolyzed monomer vapor towards a substrate at an angle other than perpendicular to the substrate, and polymerizing the monomer or pyrolyzed monomer on the substrate.Type: ApplicationFiled: June 3, 2009Publication date: October 15, 2009Applicant: The Government of the United States of America, as represented by the Secretary of the NavyInventors: Melik C. Demirel, Walter J. Dressick, David Allara
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Publication number: 20080268226Abstract: A spatially organized polymer nanostructured thin film and a ligand adsorbate attached to the polymer nanostructured thin film and, optionally, an additional material or materials attached to the ligand adsorbate. A method for forming a structure by: providing a spatially organized polymer nanostructured thin film and a ligand adsorbate, and adsorbing the ligand adsorbate onto the thin film and, optionally, binding additional material or materials to the ligand adsorbate.Type: ApplicationFiled: April 24, 2008Publication date: October 30, 2008Applicant: Naval Research LaboratoryInventors: Melik C. Demirel, Alok K Singh, Walter J. Dressick