Patents by Inventor Melissa K. Murphy

Melissa K. Murphy has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photoresist removal
    Patent number: 8236485
    Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.
    Type: Grant
    Filed: March 14, 2003
    Date of Patent: August 7, 2012
    Assignee: Advanced Technology Materials, Inc.
    Inventors: David W. Minsek, Melissa K. Murphy, David Daniel Bernhard, Thomas H. Baum
  • Photoresist removal
    Publication number: 20040180300
    Abstract: Disclosed herein is a composition and method for semiconductor processing. In one embodiment, a wet-cleaning composition for removal of photoresist is provided. The composition comprises a strong base; an oxidant; and a polar solvent. In another embodiment, a method for removing photoresist is provided. The method comprises the steps of applying a wet-cleaning composition comprising about 0.1 to about 30 weight percent strong base; about one to about 30 weight percent oxidant; about 20 to about 95 weight percent polar solvent; and removing the photoresist.
    Type: Application
    Filed: March 14, 2003
    Publication date: September 16, 2004
    Inventors: David W. Minsek, Melissa K. Murphy, David Daniel Bernhard, Thomas H. Baum