Abstract: Catalyst based reactions are taught for non-oxidative chemical conversion of liquid alcohols to higher boiling alcohols, ethers, glycol ethers and related products, comprising ethanol to butanol, propanols to hexanols, butanols to octanols, and others at ambient pressure. This same catalytic chemistry also converts substituted organic compounds comprising amines, ketones, ethers and other substituted organic compounds possessing at least one active hydrogen to related higher molecular weight products in the absence of air. The catalysts are based on selected transition metal complexes possessing a degree of symmetry. Laboratory results have demonstrated [chromium(II)]2, [cobalt(II)]2, [vanadium(II)]2 and similar families of catalysts to be effective for non-oxidative catalytic conversion of substituted organic compounds to products comprising related higher molecular weight compounds in good yields in the absence of air, at modest temperatures and ambient pressure.

Abstract: A composition for the cleaning of residues from substrates can contain from about 0.01 percent by weight to about 5 percent by weight of one or more fluoride compounds, from about 20 percent by weight to about 50 percent by weight water, from about 20 percent by weight to about 80 percent by weight of an organic amide solvent and from 0 to about 50 weight percent of an organic sulfoxide solvent. The composition can have a pH between about 7 and about 10, alternately from greater than 8 to about 10. Additionally, the composition optionally can contain corrosion inhibitors, chelating agents, surfactants, acids, and/or bases. In use of the composition, a substrate can advantageously be contacted with the composition for a time and at a temperature that permits cleaning of the substrate.

Abstract: The present invention relates to compositions for the chemical mechanical planarization (“CMP”) of barrier/adhesion layers, particularly Ta/TaN barrier/adhesion layers as occur in the manufacture of integrated circuits. CMP compositions comprise an aqueous solution of oxidizer and colloidal silica abrasive. Oxidizers include hydroxylamine nitrate, nitric acid, benzotriazole, ammonium nitrate, aluminum nitrate, hydrazine and mixtures thereof in aqueous solution.

Abstract: The invention provides methods for CMP polishing, residue removal and post-CMP polishing of a metal containing substrate. The CMP polishing methods for contacting a metal-containing substrate with a composition comprising an oxider, a salicylic acid compound, water, and an abrasive. The post-CMP polishing and residue removal methods require contacting a metal-containing substrate with a composition comprising an oxidizer, a salicylic acid compound, and water.

Abstract: The invention relates to chemical mechanical polishing of substrates using an abrasive and a fluid composition, wherein certain organosulfonic acid compounds are used as oxidizers, and particularly relates to a method of polishing substrates comprising copper, tungsten, titanium, and/or polysilicon using a chemical-mechanical polishing system comprising organosulfonic acids having an electrochemical oxidation potential greater than 0.2V as an oxidizer.

Abstract: Improved fluoride-based compositions effective in exfoliating resist residues resulting from dry etching and plasma ashing are disclosed. An excellent anti-corrosion effect, as well as resist residue exfoliation effect, can be achieved using the disclosed compositions.

Abstract: This invention relates to an improved method of melting metal, particularly reactive metals, such as aluminum, wherein heated molten metal is withdrawn from a first chamber and a portion of the withdrawn molten metal is transferred to a second chamber containing solid metal so as to melt same and a portion of the withdrawn metal is recirculated to the first chamber so as to maintain melt homogenuity therein.

Abstract: This invention relates to an improved method of melting metal, particularly reactive metals, such as aluminum, wherein heated molten metal is withdrawn from a first chamber and a portion of the withdrawn molten metal is transferred to a second chamber containing solid metal so as to melt same and a portion of the withdrawn metal is recirculated to the first chamber so as to maintain melt homogenuity therein.

Abstract: ‘Western Dawn’ is a new and distinct cultivar of Malus domestica Mill. notable for its pinkish-red blush skin color, its late maturity, and its marked resistance to oxidative browning.