Patents by Inventor Meng-Chih Chang

Meng-Chih Chang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of monitoring processing system for processing substrate
    Patent number: 10606253
    Abstract: A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.
    Type: Grant
    Filed: February 8, 2017
    Date of Patent: March 31, 2020
    Assignee: UNITED MICROELECTRONICS CORP.
    Inventors: Lian-Hua Shih, Chia-Chi Chang, Li-Ting Lin, Ching-Hsing Hsieh, Feng-Chi Chung, Meng-Chih Chang, Ming-Tung Wang, Chiu-Ping Chang, Yung-Yu Yang
  • METHOD OF MONITORING PROCESSING SYSTEM FOR PROCESSING SUBSTRATE
    Publication number: 20180224817
    Abstract: A method of monitoring a processing system for processing a substrate is provided. The method includes the following steps: acquiring data from the processing system for a plurality of parameters, the data including a plurality of data values; grouping the parameters into a plurality of sub-groups, each of the sub-groups including a plurality of correlated parameters; constructing a principle components analysis (PCA) model from the data values for the correlated parameters in a first one of the sub-groups, including normalizing the data values in the first one of the sub-groups with a first weighting factor and a second weighting factor, wherein the first weighting factor is different from the second weighting factor; and determining a statistical quantity using the PCA model.
    Type: Application
    Filed: February 8, 2017
    Publication date: August 9, 2018
    Inventors: Lian-Hua Shih, Chia-Chi Chang, Li-Ting Lin, Ching-Hsing Hsieh, Feng-Chi Chung, Meng-Chih Chang, Ming-Tung Wang, Chiu-Ping Chang, Yung-Yu Yang
  • Method of virtual metrology using combined models
    Publication number: 20160274570
    Abstract: A method of virtual metrology is disclosed. Process data and measurement values corresponding to a workpiece are collected. The process data and the measurement values are used to establish a conjecture model. A theoretical model corresponding to the workpiece and the conjecture model is used to establish another conjecture model. The another conjecture model is used to establish a virtual metrology value. The virtual metrology value is used to predict properties of a subsequently manufactured workpiece.
    Type: Application
    Filed: March 18, 2015
    Publication date: September 22, 2016
    Inventors: Lian-Hua Shih, Ching-Hsing Hsieh, Feng-Chi Chung, Chia-Chi Chang, Yu-Cheng Lin, Sian-Jhu Tsai, Meng-Chih Chang, Yi-Hui Tseng