Patents by Inventor Meng-Hsin Chen

Meng-Hsin Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240150656
    Abstract: A liquid crystal polymer, composition, liquid crystal polymer film, laminated material and method of forming liquid crystal polymer film are provided. The liquid crystal polymer includes a first repeating unit, a second repeating unit, a third repeating unit, a fourth repeating unit, and a fifth repeating unit. The first repeating unit has a structure of Formula (I), the second repeating unit has a structure of Formula (II), the third repeating unit has a structure of Formula (III), the fourth repeating unit has a structure of Formula (IV), and the fifth repeating unit has a structure of Formula (V), a structure of Formula (VI), or a structure of Formula (VII) wherein A1, A2, A3, A4, X1, Z1, R1, R2, R3 and Q are as defined in the specification.
    Type: Application
    Filed: September 22, 2023
    Publication date: May 9, 2024
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Lin CHU, Jen-Chun CHIU, Po-Hsien HO, Yu-Min HAN, Meng-Hsin CHEN, Chih-Hsiang LIN
  • Publication number: 20240145627
    Abstract: An epitaxial structure of a semiconductor light-emitting element includes an n-type layer, a V-pit control layer, a light-emitting layer, and a p-type layer stacked from bottom to top. The light-emitting layer includes a plurality of well layers and a plurality of barrier layers stacked alternately. The V-pit control layer includes a first superlattice layer, and a distance between a bottom surface of the V-pit control layer and a bottom surface of the first superlattice layer is less than or equal to 0.15 ?m. The bottom surface of the first superlattice layer and a bottom surface of the light-emitting layer have a distance therebetween ranging from 0.05 ?m to 0.3 ?m, and each of the first superlattice layer and the light-emitting layer is an Indium (In)-containing layer. A semiconductor light-emitting element and a light-emitting device are also provided.
    Type: Application
    Filed: October 31, 2023
    Publication date: May 2, 2024
    Inventors: Meng-Hsin YEH, Zhousheng JIANG, Bing-Yang CHEN, Dongpo CHEN, Chung-Ying CHANG
  • Publication number: 20240124706
    Abstract: A liquid crystal polymer, composition, liquid crystal polymer film, laminated material and method of forming liquid crystal polymer film are provided. The liquid crystal polymer includes a first repeating unit, a second repeating unit, a third repeating unit, and a fourth repeating unit. The first repeating unit has a structure of Formula (I), the second repeating unit has a structure of Formula (II), the third repeating unit has a structure of Formula (III), and the fourth repeating unit has a structure of Formula (IV), a structure of Formula (V) or a structure of Formula (VI) wherein A1, A2, A3, Z1, R1, R2, R3 and Q are as defined in the specification.
    Type: Application
    Filed: September 22, 2023
    Publication date: April 18, 2024
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Lin CHU, Jen-Chun CHIU, Po- Hsien HO, Yu-Min HAN, Meng-Hsin CHEN, Chih-Hsiang LIN
  • Patent number: 11866632
    Abstract: Liquid-crystal polymer is composed of the following repeating units: 10 mol % to 35 mol % of 10 mol % to 35 mol % of 10 mol % to 50 mol % of and 10 mol % to 40 mol % of 10 mol % to 40 mol % of or a combination thereof. Each of AR1, AR2, AR3, and AR4 is independently AR5 or AR5-Z-AR6, in which each of AR5 and AR6 is independently or a combination thereof, and Z is —O—, or C1-5 alkylene group. Each of X and Y is independently H, C1-5 alkyl group, CF3, or wherein R2 is H, CH3, CH(CH3)2, C(CH3)3, CF3, or n=1 to 4; and wherein R1 is C1-5 alkylene group.
    Type: Grant
    Filed: July 1, 2020
    Date of Patent: January 9, 2024
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Lin Chu, Jen-Chun Chiu, Zu-Chiang Gu, Po-Hsien Ho, Meng-Hsin Chen, Chih-Hsiang Lin
  • Patent number: 11572438
    Abstract: A liquid-crystal polymer includes at least one repeating unit having a spiro structure, and the repeating unit occupies 1 mol % to 20 mol % of the liquid-crystal polymer. The liquid-crystal polymer is composed of the following repeating units: 1 mol % to 20 mol % of 10 mol % to 35 mol % of 10 mol % to 35 mol % of 10 mol % to 50 mol % of and 10 mol % to 40 mol % of AR1 is wherein each of ring R and ring S is independently a C3-20 ring, ring R and ring S share a carbon atom, and each of K1 and K2 is independently a C5-20 conjugated system. Each of AR2, AR3, AR4, and AR5 is independently AR6 or AR6—Z—AR7.
    Type: Grant
    Filed: July 1, 2020
    Date of Patent: February 7, 2023
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Lin Chu, Jen-Chun Chiu, Zu-Chiang Gu, Po-Hsien Ho, Meng-Hsin Chen, Chih-Hsiang Lin
  • Publication number: 20220102943
    Abstract: A method of fabricating a laser diode with a reflective layer which is applied to an epitaxial structure of the laser diode where initially the laser diode is placed in a coating device. The laser diode is then coated with additional layers of insulation, metal and a protective layer. A rapid thermal annealing process is applied to the layered laser diode. The insulation layer, metal layer and protective layer form a reflective structure on one side of the laser diode.
    Type: Application
    Filed: August 27, 2021
    Publication date: March 31, 2022
    Inventors: MENG-HSIN CHEN, HSUEH-HUI YANG, CHUN-LING CHANG
  • Publication number: 20210002555
    Abstract: A liquid-crystal polymer includes at least one repeating unit having a spiro structure, and the repeating unit occupies 1 mol % to 20 mol % of the liquid-crystal polymer. The liquid-crystal polymer is composed of the following repeating units: 1 mol % to 20 mol % of 10 mol % to 35 mol % of 10 mol % to 35 mol % of 10 mol % to 50 mol % of and 10 mol % to 40 mol % of AR1 is wherein each of ring R and ring S is independently a C3-20 ring, ring R and ring S share a carbon atom, and each of K1 and K2 is independently a C5-20 conjugated system. Each of AR2, AR3, AR4, and AR5 is independently AR6 or AR6—Z—AR7.
    Type: Application
    Filed: July 1, 2020
    Publication date: January 7, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Lin CHU, Jen-Chun CHIU, Zu-Chiang GU, Po-Hsien HO, Meng-Hsin CHEN, Chih-Hsiang LIN
  • Publication number: 20210002554
    Abstract: Liquid-crystal polymer is composed of the following repeating units: 10 mol % to 35 mol % of 10 mol % to 35 mol % of 10 mol % to 50 mol % of and 10 mol % to 40 mol % of 10 mol % to 40 mol % of or a combination thereof. Each of AR1, AR2, AR3, and AR4 is independently AR5 or AR5-Z-AR6, in which each of AR5 and AR6 is independently or a combination thereof, and Z is —O—, or C1-5 alkylene group. Each of X and Y is independently H, C1-5 alkyl group, CF3, or wherein R2 is H, CH3, CH(CH3)2, C(CH3)3, CF3, or n=1 to 4 ; and wherein R1 is C1-5 alkylene group.
    Type: Application
    Filed: July 1, 2020
    Publication date: January 7, 2021
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Yu-Lin CHU, Jen-Chun CHIU, Zu-Chiang GU, Po-Hsien HO, Meng-Hsin CHEN, Chih-Hsiang LIN
  • Patent number: 10717865
    Abstract: A polyester elastomer is provided, which includes a product of reacting (a) amide oligomer, (b) polyalkylene glycol, and (c) poly(alkylene arylate). (a) Amide oligomer has a chemical structure of or a combination thereof, wherein R1 is C4-8 alkylene group, R2 is C4-8 alkylene group, and each of x is independently an integer of 10 to 20. (b) Polyalkylene glycol has a chemical structure of wherein R3 is C2-10 alkylene group, and y is an integer of 20 to 30. (c) Poly(alkylene arylate) has a chemical structure of or a combination thereof, wherein Ar is R4 is C2-6 alkylene group, and z is an integer of 1 to 10.
    Type: Grant
    Filed: June 2, 2017
    Date of Patent: July 21, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Sheng-Lung Chang, Jen-Chun Chiu, Chih-Hsiang Lin, Meng-Hsin Chen, Chien-Ming Chen, Chuh-Yung Chen, Yen-Chen Lin
  • Publication number: 20200183054
    Abstract: An anti-reflection composite layer including a substrate, a plurality of first optical layers and a plurality of second optical layers is provided. The first optical layers and the second optical layers are alternately formed on the carrier surface of the substrate by a PVD coating process, and the refractive index of the materials forming the first optical layers is higher than that of the materials forming the second optical layers. A manufacturing method thereof is also provided.
    Type: Application
    Filed: July 3, 2019
    Publication date: June 11, 2020
    Inventors: Po-Wen Chen, En-Shih Chen, Meng-Hsin Chen, Jin-Yu Wu, Der-Jun Jan
  • Patent number: 10654969
    Abstract: A thin film is provided, which includes a polymer formed by reacting (a) p-hydroxybenzoic acid, (b) 6-hydroxy 2-naphthoic acid and (c) branched-monomer. (c) branched-monomer is or a combination thereof, wherein R is aryl group, heteroaryl group, or cycloalkyl group, and each of R1 is independently —OH, —NH2, or —COOH. The molar ratio of (a) p-hydroxybenzoic acid over (b) 6-hydroxy 2-naphthoic acid is between 50:50 and 90:10. The molar ratio of (c) branched-monomer over the sum of (a) p-hydroxybenzoic acid and (b) 6-hydroxy 2-naphthoic acid is between 0.25:100 and 0.5:100. The polymer has an intrinsic viscosity of 4 dL/g to 6 dL/g.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: May 19, 2020
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Meng-Hsin Chen, Chih-Hsiang Lin, Jen-Chun Chiu
  • Patent number: 10377705
    Abstract: A method for preparing a cationic sulfoxide intermediate having the following formula wherein Ar1 and Ar2 are substituted or unsubstituted aryl groups that are the same or different, includes reacting hydrogen peroxide with (i) a compound having the following formula (2) or sulfonic acid R?SO3H, wherein R? is CH3, CF3, phenyl, toluene, or OH, and (ii) a cationic thioether intermediate having the following formula (4) to obtain the cationic sulfoxide intermediate: wherein R is a substituted or unsubstituted C1-C6 alkyl group; and wherein Ar1 and Ar2 are as defined above and Y is an anion.
    Type: Grant
    Filed: December 22, 2016
    Date of Patent: August 13, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Po-Hsien Ho, Chih-Hsiang Lin, Meng-Hsin Chen, Cheng-Hsing Fan, Hsin-Ching Kao, Yih-Her Chang
  • Patent number: 10369129
    Abstract: Disclosed herein is a long acting pharmaceutical composition for treating or preventing human immunodeficiency virus (HIV) infection. The pharmaceutical composition comprises a suspension of a lysine-based aspartyl protease inhibitor or salt thereof, a surface modifier, and a pharmaceutically acceptable carrier; wherein the lysine-based aspartyl protease inhibitor or salt thereof has an average effective particle size of less than about 500 nm. A method for treating or preventing HIV infection with the pharmaceutical composition is also disclosed.
    Type: Grant
    Filed: May 31, 2016
    Date of Patent: August 6, 2019
    Assignee: TaiMed Biologics, Inc.
    Inventors: James Nienyuan Chang, Hsiang-Fa Liang, Meng-Hsin Chen, Kuei-Ling Kuo, An-Chieh Li
  • Patent number: 10287396
    Abstract: A polymer is provided. The polymer has a repeating unit having a structure represented by Formula (I) or Formula (II) wherein Ar1 and Ar2 can be substituted or unsubstituted aryl diradical; Y? can be R2SO3? or ClO4?; R1 can be C1-6 alkyl; Ar1 and Ar2 are different; and, R2 can be C1-6 alkyl, substituted or unsubstituted aromatic ring, or C1-6 haloalkyl.
    Type: Grant
    Filed: December 29, 2016
    Date of Patent: May 14, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Po-Hsien Ho, Chih-Hsiang Lin, Meng-Hsin Chen, Cheng-Hsing Fan, Hsin-Ching Kao, Yih-Her Chang
  • Patent number: 10184028
    Abstract: A method for preparing a polymer is provided. The method for preparing a polymer includes subjecting at least one monomer having a structure represented by Formula (I) to a reaction in the presence of sulfonic acid, diphenyl amine, and oxygen-containing phosphide, obtaining a sulfonium salt polymer wherein x is 0, 1, or 2; R1 is C1-6 alkyl group; and R2 is independently hydrogen, or C1-6 alkyl group. In particular, the molar ratio of the diphenyl amine to the oxygen-containing phosphide is from 4:1 to 1:1.
    Type: Grant
    Filed: June 20, 2018
    Date of Patent: January 22, 2019
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Po-Hsien Ho, Chih-Hsiang Lin, Meng-Hsin Chen, Cheng-Hsing Fan, Hsin-Ching Kao, Yih-Her Chang
  • Publication number: 20180298146
    Abstract: A method for preparing a polymer is provided. The method for preparing a polymer includes subjecting at least one monomer having a structure represented by Formula (I) to a reaction in the presence of sulfonic acid, diphenyl amine, and oxygen-containing phosphide, obtaining a sulfonium salt polymer wherein x is 0, 1, or 2; R1 is C1-6 alkyl group; and R2 is independently hydrogen, or C1-6 alkyl group. In particular, the molar ratio of the diphenyl amine to the oxygen-containing phosphide is from 4:1 to 1:1.
    Type: Application
    Filed: June 20, 2018
    Publication date: October 18, 2018
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Po-Hsien HO, Chih-Hsiang LIN, Meng-Hsin CHEN, Cheng-Hsing FAN, Hsin-Ching KAO, Yih-Her CHANG
  • Publication number: 20180237582
    Abstract: A thin film is provided, which includes a polymer formed by reacting (a) p-hydroxybenzoic acid, (b) 6-hydroxy 2-naphthoic acid and (c) branched-monomer. (c) branched-monomer is or a combination thereof, wherein R is aryl group, heteroaryl group, or cycloalkyl group, and each of R1 is independently —OH, —NH2, or —COOH. The molar ratio of (a) p-hydroxybenzoic acid over (b) 6-hydroxy 2-naphthoic acid is between 50:50 and 90:10. The molar ratio of (c) branched-monomer over the sum of (a) p-hydroxybenzoic acid and (b) 6-hydroxy 2-naphthoic acid is between 0.25:100 and 0.5:100. The polymer has an intrinsic viscosity of 4dL/g to 6dL/g.
    Type: Application
    Filed: December 29, 2017
    Publication date: August 23, 2018
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Meng-Hsin CHEN, Chih-Hsiang LIN, Jen-Chun CHIU
  • Patent number: 10053572
    Abstract: The disclosure provides a masterbatch, a method for fabricating the same and a film formed from the masterbatch. The masterbatch includes a product prepared from a composition via polymerization and granulation. The composition includes: terephthalic acid; and a silicon dioxide dispersion, wherein the silicon dioxide dispersion includes surface-modified silicon dioxide particles disposed within ethylene glycol, and the surface-modified silicon dioxide particle has first functional groups and second functional groups bonded on the surface of the silicon dioxide particles, wherein the first functional groups have a structure represented by and the second functional groups include a C1-8 haloalkyl functional group, C1-8 alkoxy functional group, C1-8 aminoalkyl functional group, C2-8 alkenyl group, or epoxy group, R1 is hydrogen or a C1-3 alkyl functional group, and n is 1-4.
    Type: Grant
    Filed: May 1, 2013
    Date of Patent: August 21, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Wen-Jiunn Chen, Ming-Tzung Wu, Te-Yi Chang, Chih-Hsiang Lin, Chung-Cheng Lin, Meng-Hsin Chen
  • Patent number: 9994679
    Abstract: A method for preparing a polyarylene sulfide includes reacting a methyl 4-(arylthio)aryl sulfoxide compound with sulfuric acid, methanesulfonic acid, benzenesulfonic acid, p-toluenesulfonic acid or trifluoromethanesulfonic acid to obtain a polysulfonium intermediate; and demethylating the polysulfonium intermediate to obtain a polyarylene sulfide, wherein the polysulfonium intermediate is demethylated with aqueous HCl, HBr, or HI.
    Type: Grant
    Filed: December 16, 2016
    Date of Patent: June 12, 2018
    Assignee: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Po-Hsien Ho, Chih-Hsiang Lin, Meng-Hsin Chen, Cheng-Hsing Fan, Hsin-Ching Kao, Yih-Her Chang
  • Publication number: 20170349744
    Abstract: A polyester elastomer is provided, which includes a product of reacting (a) amide oligomer, (b) polyalkylene glycol, and (c) poly(alkylene arylate). (a) Amide oligomer has a chemical structure of or a combination thereof, wherein R1 is C4-8 alkylene group, R2 is C4-8 alkylene group, and each of x is independently an integer of 10 to 20. (b) Polyalkylene glycol has a chemical structure of wherein R3 is C2-10 alkylene group, and y is an integer of 20 to 30. (c) Poly(alkylene arylate) has a chemical structure of or a combination thereof, wherein Ar is R4 is C2-6 alkylene group, and z is an integer of 1 to 10.
    Type: Application
    Filed: June 2, 2017
    Publication date: December 7, 2017
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Sheng-Lung CHANG, Jen-Chun CHIU, Chih-Hsiang LIN, Meng-Hsin CHEN, Chien-Ming CHEN, Chuh-Yung CHEN, Yen-Chen LIN