Abstract: In a method for forming an integrated semiconductor device, a first inter-layer dielectric (ILD) layer is formed over a semiconductor device that includes a first transistor structure, a two-dimensional (2D) material layer is formed over and in contact with the first ILD layer, the 2D material layer is patterned to form a channel layer of a second transistor structure, a source electrode and a drain electrode of the second transistor structure are formed over the patterned 2D material layer and laterally spaced apart from each other, a gate dielectric layer of the second transistor structure is formed over the patterned 2D material layer, the source electrode and the drain electrode, and a gate electrode of the second transistor structure is formed over the gate dielectric layer and laterally between the source electrode and the drain electrode.

Abstract: An online monitoring method of driver state and a system using the same are provided. First a driver model is established, wherein the driver model generates a steering angle to control transportation means for riding according to the lateral position error of the riding transportation means. Next, a system identification processing is performed on the lateral position error and the steering angle of the riding transportation means to obtain a transfer function of the driver model. After that, an analysis processing is performed on the driver model transfer function to extract specific information therefrom, following by performing an assessment processing on the specific information and multiple statistics of raw data to generate the driver state assessment.