Abstract: A semiconductor device and a method of forming the same are provided. The semiconductor device includes a substrate, a gate structure, a dielectric structure and a contact structure. The substrate has source/drain (S/D) regions. The gate structure is on the substrate and between the S/D regions. The dielectric structure covers the gate structure. The contact structure penetrates through the dielectric structure to connect to the S/D region. A lower portion of a sidewall of the contact structure is spaced apart from the dielectric structure by an air gap therebetween, while an upper portion of the sidewall of the contact structure is in contact with the dielectric structure.

Abstract: A video conference device may include at least one camera, at least one processor, and an interface. The at least one camera may be arranged to capture an image of a scene. The at least one processor may be arranged to: if a trigger occurs, detect a display region in the image based on a location of a pattern in the image, wherein in response to the display region being detected, the display region is excluded from the image; detect at least one specific object in the image; and extract the at least one detected specific object in the image as at least one local image. The interface may be arranged to transmit the at least one local image.