Patents by Inventor Meng-Lin Lu

Meng-Lin Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • ELECTRONIC CIRCUIT SIMULATION BASED ON RANDOM TELEGRAPH SIGNAL NOISE
    Publication number: 20220357390
    Abstract: A device may generate, using a random telegraph signal (RTS) noise generator, a simulated RTS noise as input to a transistor included in an electronic circuit. The device may determine, based on the simulated RTS noise input to the transistor, a simulated output signal from the transistor.
    Type: Application
    Filed: May 6, 2021
    Publication date: November 10, 2022
    Inventors: Chien-Ming HUNG, Ming-Long FAN, Meng-Lin LU, Ya-Chin LIANG, Wai-Kit LEE, Jyun-Yan KUO, Wei-Jen CHANG, Chung-Shi CHIANG
  • Image process method to improve mask inspection performance
    Patent number: 9529255
    Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: December 27, 2016
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Meng-Lin Lu, Ching-Ting Yang, Chun-Jen Chen, Chien-Hung Lai, Jong-Yuh Chang
  • Image Process Method to Improve Mask Inspection Performance
    Publication number: 20150154326
    Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.
    Type: Application
    Filed: December 4, 2013
    Publication date: June 4, 2015
    Applicant: Taiwan Semiconductor Manufacturing Co.,Ltd.
    Inventors: Meng-Lin Lu, Ching-Ting Yang, Chun-Jen Chen, Chien-Hung Lai, Jong-Yuh Chang