Abstract: The invention provides a method of a cold plasma surface process for ferrous absorbent including the following steps. Firstly, a substrate is disposed in a vacuum chamber under a room temperature, and electrical energy is transmitted to the substrate; next, organic silicon monomer is added into the vacuum chamber under the room temperature; at last, the organic silicon monomer is deposited on the surface of the substrate by a plasma polymerization process to form a hydrophobic film on the surface of the substrate.

Abstract: A method for manufacturing an organic light emitting diode (OLED) is disclosed, which comprises: (a) providing a substrate on which an anode is formed; (b) coating a Br-fluorocarbon precursor on the anode, and curing the Br-fluorocarbon precursor with UV light to form a fluorocarbon polymer film; (c) forming an organic light emitting structure on the fluorocarbon polymer film; and (d) forming a cathode on the organic light emitting structure. After coating, the remaining Br-fluorocarbon precursor can be recycled. Furthermore, the process of removing solvent is unnecessary. Therefore, the problem of waste can be prevented. Hence, it is possible to manufacture an OLED with a simple process and low cost by the method of the present invention.

Abstract: An organic light emitting diode (OLED) and a method for manufacturing the same are disclosed, wherein the method comprises following steps: (a) providing a substrate having a first conductive layer; (b) providing a precursor and polymerizing the precursor by plasma to form a fluorocarbon polymer layer or a fluorocarbon copolymer layer on the first conductive layer of the substrate; (c) forming an organic light emitting structure on the fluorocarbon polymer layer or a fluorocarbon copolymer layer; and (d) forming a second conductive layer on the organic light emitting structure. The hole injection efficiency of the OLED can be improved by the method of the present invention. Hence, the current density of the OLED can be greatly increased.

Abstract: An electromagnetic wave absorbing material and a method for preparing the same are disclosed. The electromagnetic wave absorbing material consists of liquid resin, carbon nanocapsules, carbon fiber and hollow glass microsphere. All components are mixed well to form the electromagnetic-wave absorbing material. The method for preparing the electromagnetic-wave absorbing materials includes steps of: mixing the liquid resin, carbon nanocapsules, carbon fiber and hollow glass microsphere well to form a slurry solution; pour the slurry solution into a mold; after curing and cooling, an electromagnetic-wave absorbing material is obtained. The electromagnetic-wave absorbing material with density ranging from 0.75 to 1.0 g/ml matches requirements of compact design and light weight in high technology industries.