Abstract: Temperature control for an image signal processor is provided. An integrated circuit includes a plurality of photodetectors, each electrically coupled with a source follower (SF). The plurality of the SF are electrically coupled with an image signal processor (ISP). The integrated circuit includes a temperature detection circuit thermally coupled with at least one of the SF or the ISP. The integrated circuit includes control circuitry configured to activate a temperature control device (TCD) configured to heat a portion of the ISP. The engagement can be based on a temperature detected by the temperature detection circuit.

Abstract: A device may generate, using a random telegraph signal (RTS) noise generator, a simulated RTS noise as input to a transistor included in an electronic circuit. The device may determine, based on the simulated RTS noise input to the transistor, a simulated output signal from the transistor. The device may automatically modify the electronic circuit based on the simulated output signal.

Abstract: A design method is provided. Design data of a circuit is received, and the circuit is configured to perform a function. A simulation is performed based on the design data of the circuit to obtain an output corresponding to the function. The circuit is modified by adding additional devices in series with at least one problematic transistor in the circuit when random telegraph noise (RTN) of the output does not meet a design specification. A layout of the modified circuit is generated when the RTN of the output of the modified circuit meets the design specification.

Abstract: A device may generate, using a random telegraph signal (RTS) noise generator, a simulated RTS noise as input to a transistor included in an electronic circuit. The device may determine, based on the simulated RTS noise input to the transistor, a simulated output signal from the transistor.

Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.

Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.