Abstract: A method for simultaneously determining fat-soluble vitamins and carotenoids in serum, and belonging to the technical field of analytical chemistry, includes an ionic liquid (IL) or a binary mixed solvent composed of an IL and another solvent is adopted as an extractant; the biological samples are pre-treated by liquid-liquid extraction (LLE) and then detected by high-performance liquid chromatography (HPLC); retinyl acetate and trans-?-apo-8?-carotenal are adopted as the internal standards for fat-soluble vitamins and carotenoids, respectively; and the internal standard method is adopted to establish standard curves for quantification based on the retention time and the UV-Vis absorption spectrum. Compared with the existing methods, in the disclosure, the pretreatment process is simple and easy to be conducted, the sample can be prepared in a short time, and the toxic and harmful organic solvent is used at a reduced amount.

Abstract: A method for simultaneously determining fat-soluble vitamins and carotenoids in serum, and belonging to the technical field of analytical chemistry, includes an ionic liquid (IL) or a binary mixed solvent composed of an IL and another solvent is adopted as an extractant; the biological samples are pre-treated by liquid-liquid extraction (LLE) and then detected by high-performance liquid chromatography (HPLC); retinyl acetate and trans-?-apo-8?-carotenal are adopted as the internal standards for fat-soluble vitamins and carotenoids, respectively; and the internal standard method is adopted to establish standard curves for quantification based on the retention time and the UV-Vis absorption spectrum. Compared with the existing methods, in the disclosure, the pretreatment process is simple and easy to be conducted, the sample can be prepared in a short time, and the toxic and harmful organic solvent is used at a reduced amount.

Abstract: An apparatus and method of forming a dielectric film layer using a physical vapor deposition process include delivering a sputter gas to a substrate positioned in a processing region of a process chamber, the process chamber having a dielectric-containing sputter target, delivering an energy pulse to the sputter gas to create a sputtering plasma, the sputtering plasma being formed by energy pulses having an average voltage between about 800 volts and about 2000 volts and an average current between about 50 amps and about 300 amps at a frequency which is less than 50 kHz and greater than 5 kHz and directing the sputtering plasma toward the dielectric-containing sputter target to form an ionized species comprising dielectric material sputtered from the dielectric-containing sputter target, the ionized species forming a dielectric-containing film on the substrate.

Abstract: Embodiments presented herein relate to a method of and apparatus for processing a substrate in a semiconductor processing system. The method begins by initializing a pulse synchronization controller coupled between a pulse RF bias generator and a HIPIMs generator. A first timing signal is sent by the pulse synchronization controller to the pulse RF bias generator and the HIPIMs generator. A sputtering target and an RF electrode disposed in a substrate support is energized based on the first timing signal. The target and the electrode is de-energized based on an end of the timing signal. A second timing signal is sent by the pulse synchronization controller to the pulse RF bias generator and the electrode is energized and de-energized without energizing the target in response to the second timing signal.