Patents by Inventor Mengsen WANG

Mengsen WANG has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20260245504
    Abstract: The present application discloses an array substrate and a display panel. The array substrate includes a pixel circuit, the pixel circuit includes a first switching transistor and a driving transistor; the first switching transistor is connected to the driving transistor, the first switching transistor is configured to control a gate potential and a first electrode potential of the driving transistor, and the driving transistor is configured to form a driving current according to the gate potential and the first electrode potential; a threshold voltage of the driving transistor is greater than a threshold voltage of the first switching transistor.
    Type: Application
    Filed: April 8, 2026
    Publication date: August 20, 2026
    Applicant: Kunshan Govisionox Optoelectronics Co., Ltd.
    Inventors: Fa-Hsyang CHEN, Mengsen WANG, Zidong GUO, Enqing GUO, Cuili GAI, Wangfeng XI, Xiujian ZHU
  • Publication number: 20260090019
    Abstract: The present disclosure provides a thin film transistor, a preparation method thereof, and a display panel. The thin film transistor includes an active layer and a first gate electrode located on a base substrate, the active layer includes a first film layer and a second film layer stacked on the base substrate, the second film layer is located between the first film layer and the first gate electrode, the first film layer includes oxygen element, the second film layer includes crystalline oxide, and the first film layer and the second film layer are formed via synchronous annealing. This approach not only prevents the thin film transistor channel from conducting due to insufficient oxygen content in the second film layer but also avoids issues such as etching residues caused by difficulties in etching the second film layer due to excessive oxygen content during the etching process.
    Type: Application
    Filed: December 5, 2025
    Publication date: March 26, 2026
    Applicant: Yungu (Gu’an) Technology Co., Ltd.
    Inventors: Fa-Hsyang CHEN, Yinghai MA, Bin GUO, Xue LIU, Qidi LIU, Mengsen WANG