Patents by Inventor Merritt L. Funk

Merritt L. Funk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Feature dimension deviation correction system, method and program product
    Patent number: 7502660
    Abstract: A system, method and program product for correcting a deviation of a dimension of a feature from a target in a semiconductor process, are disclosed. The invention determines an origin of a deviation in a feature dimension from a target dimension regardless of whether it is based on processing or metrology. Adjustments for wafer processing variation of previous process tools can be fed forward, and adjustments for the process and/or integrated metrology tools may be fed back automatically during the processing of semiconductor wafers. The invention implements process reference wafers to determine the origin in one mode, and measurement reference wafers to determine the origin of deviations in another mode.
    Type: Grant
    Filed: October 2, 2007
    Date of Patent: March 10, 2009
    Assignees: International Business Machines Corporation, Tokyo Electron Limited
    Inventors: David V. Horak, Wesley C. Natzle, Merritt L. Funk, Kevin J. Lally, Daniel Prager
  • Feature dimension deviation correction system, method and program product
    Patent number: 7289864
    Abstract: A system, method and program product for correcting a deviation of a dimension of a feature from a target in a semiconductor process, are disclosed. The invention determines an origin of a deviation in a feature dimension from a target dimension regardless of whether it is based on processing or metrology. Adjustments for wafer processing variation of previous process tools can be fed forward, and adjustments for the process and/or integrated metrology tools may be fed back automatically during the processing of semiconductor wafers. The invention implements process reference wafers to determine the origin in one mode, and measurement reference wafers to determine the origin of deviations in another mode.
    Type: Grant
    Filed: July 12, 2004
    Date of Patent: October 30, 2007
    Assignees: International Business Machines Corporation, Tokyo Electron Limited
    Inventors: David V. Horak, Wesley C. Natzle, Merritt L. Funk, Kevin J. Lally, Daniel Prager
  • Process control system using feed forward control threads based on material groups
    Patent number: 6148239
    Abstract: A process control system using feed forward control threads based on material groups performs material tracking to account and adjust for variability of processing in a process flow that includes multiple machines, machine configurations, and machine setups. The process control system using feed forward control threads based on material groups distinguishes variations in processing parameters and characteristics for processed material samples and modifies processing at subsequent steps in response to the variations. The process control system using feed forward control threads based on material groups controls materials groups so that material samples with a like processing history are processed with a similar machine configuration or setup for subsequent processing steps.
    Type: Grant
    Filed: December 12, 1997
    Date of Patent: November 14, 2000
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Merritt L. Funk, Lori A. Peters