Abstract: A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed.

Abstract: The present invention relates to a genotyping kit for diagnosis of detecting the human papillomavirus (HPV) infection, probes for genotyping the HPV, and DNA chips including the probes. Also, the present invention relates to a method for diagnosis of HPV infection.

Abstract: In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.

Abstract: A system and a method for controlling the multi-component composition such as photoresist, stripper, developer, etchant, thinner, rinser/cleaner and etch bead remover, for a lithography process, which is used for manufacturing a semiconductor device, a liquid crystal display device and so on, are disclosed.

Abstract: The present invention relates to a genotyping kit for diagnosis of detecting the human papillomavirus (HPV) infection, probes for genotyping the HPV, and DNA chips including the probes. Also, the present invention relates to a method for diagnosis of HPV infection.

Abstract: The present invention relates to diagnosis kit for Mycobacterium species identification and drug-resistance detection and manufacturing method thereof, which can discriminate a Mycobacterium Tuberculosis rpoB gene point mutation relating to the Mycobacterium species identification and drug-resistance swiftly, exactly and in large quantities using an oligonucleotide chip. The diagnosis kit for Mycobacterium species identification and drug-resistance detection in accordance with the present invention consists of an oligonucleotide chip including a Mycobacterium tuberculosis complex probe, a Mycobacterium species identification probe and a drug-resistance detection probe of a Mycobacterium tuberculosis rpoB gene, and a fluorescent material containing a biotin-binding protein so as to detect hybridization of amplified products of a specimen marked as biotine and the corresponding probe.

Abstract: In a method of controlling a metallic layer etching process for fabricating a semiconductor device or a liquid crystal display device, the composition of the etchant used in etching the metallic layer is first analyzed with the NIR spectrometer. The state of the etchant is then determined by comparing the analyzed composition with the reference composition. In case the life span of the etchant comes to an end, the etchant is replaced with a new etchant. By contrast, in case the life span of the etchant is left over, the etchant is delivered to the next metallic layer etching process. This analysis technique may be applied to the etchant regenerating process in a similar way.

Abstract: In a method of controlling a photoresist stripping process for fabricating a semiconductor device or a liquid crystal display device, the composition of the stripper used in stripping the photoresist layer is first analyzed with the NIR spectrometer. The state of the stripper is then determined by comparing the analyzed composition with the reference composition. In case the life span of the stripper comes to an end, the stripper is replaced with a new stripper. By contrast, in case the life span of the stripper is left over, the stripper is delivered to the next photoresist stripping process. This analysis technique may be applied to the photoresist stripper regenerating process in a similar way.