Abstract: The present invention relates to a photosensitive resin that has high solubility in and good etching resistance to a developer even under sub-248 nm and 193 nm short-wavelength exposure sources and forms a low line edge roughness. The present invention also relates to a photoresist composition including the photosensitive resin.

Abstract: The present invention relates to a method for manufacturing a flexible photo-patterned mask. The method includes a) coating a photoresist composition on a substrate to form a photoresist film, b) exposing the photoresist film to pattern the photoresist film, c) developing the patterned photoresist film, and d) curing the developed photoresist film to form a patterned layer having a plurality of tapered openings.

Abstract: Provided is an oxime ester phenylcarbazole compound useful as a photoinitiator for photocrosslinking. Specifically, the carbon atom forming a double bond with the nitrogen atom in the oxime ester moiety of the oxime ester phenylcarbazole compound is bonded to the phenylcarbazole group and is directly bonded to a (C1-C20)alkyl or (C6-C20)aryl group. Also provided is a photopolymerizable composition including the oxime ester phenylcarbazole compound. The oxime ester phenylcarbazole compound and the photopolymerizable composition have improved solubilities, are highly photosensitive, and exhibit excellent physical properties in terms of residual film ratio, pattern stability, resist adhesiveness. Due to these advantages, the oxime ester phenylcarbazole compound and the photopolymerizable composition are suitable for use in black resists, color resists, overcoats, column spacers, and organic insulating films of LCDs.

Abstract: Disclosed herein is an organic thin film device. The organic thin film device includes a UV barrier layer, which has a UV blocking effect, in addition to at least one electrode and at least one organic semiconductor layer on a substrate. The organic thin film device employs a film or a coating liquid which comprises phenolic derivatives or cyanoacrylate derivatives exhibiting a UV-blocking effect in a wavelength of 400 nm or less, so that photodecomposition of an organic material for use in fabrication of the organic thin film device by UV rays and sunlight can be minimized, thereby innovatively increasing lifetime of the device.

Abstract: A method of restoring a target network to which users having different recovery requirements are connected is provided. The method includes analyzing network components including availability information of each user and parameters reflecting characteristics of the target network; and determining optimized restoration architecture for the target network based on the result of the analysis. Accordingly, when failure occurs in a network to which various subscribers having different recovery requirements are connected, the network can be promptly recovered from the failure.

Abstract: A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an alkyl group having one through twenty carbon atoms, a sensitizer, and a solvent.

Abstract: A negative resist composition used in a liquid-crystal display element is disclosed. The negative resist composition according to the present invention includes a binder resin consisting of a copolymer including four predetermined monomers, a (meth)acryl monomer including at least 3 (meth)acryl groups, a (meth)acryl monomer including one or two (meth)acryl groups and a photo-initiator. The negative resist composition according to the present invention may be useful to significantly increase the manufacturing yield because it shows an extremely low brittleness during a bonding process or a hot process due to good physical properties such as film retention, pattern stability, adhesion to a substrate, and chemical resistance, as well as good flexibility upon formation of the pattern.

Abstract: A photoresist composition includes a novolac resin having where each of R1, R2, R3, and R4 is an alkyl group having a hydrogen atom or between one through six carbon atoms and n is an integer ranging from zero through three; and a mercapto compound having Z1-SH, or SH-Z2-SH, where each of Z1 and Z2 is an alkyl group or an allyl group having one through twenty carbon atoms, a sensitizer, and a solvent.