Abstract: The present invention relates to a photosensitive resin that has high solubility in and good etching resistance to a developer even under sub-248 nm and 193 nm short-wavelength exposure sources and forms a low line edge roughness. The present invention also relates to a photoresist composition including the photosensitive resin.

Abstract: The present invention relates to a method for manufacturing a flexible photo-patterned mask. The method includes a) coating a photoresist composition on a substrate to form a photoresist film, b) exposing the photoresist film to pattern the photoresist film, c) developing the patterned photoresist film, and d) curing the developed photoresist film to form a patterned layer having a plurality of tapered openings.

Abstract: Provided is an oxime ester phenylcarbazole compound useful as a photoinitiator for photocrosslinking. Specifically, the carbon atom forming a double bond with the nitrogen atom in the oxime ester moiety of the oxime ester phenylcarbazole compound is bonded to the phenylcarbazole group and is directly bonded to a (C1-C20)alkyl or (C6-C20)aryl group. Also provided is a photopolymerizable composition including the oxime ester phenylcarbazole compound. The oxime ester phenylcarbazole compound and the photopolymerizable composition have improved solubilities, are highly photosensitive, and exhibit excellent physical properties in terms of residual film ratio, pattern stability, resist adhesiveness. Due to these advantages, the oxime ester phenylcarbazole compound and the photopolymerizable composition are suitable for use in black resists, color resists, overcoats, column spacers, and organic insulating films of LCDs.

Abstract: A negative resist composition used in a liquid-crystal display element is disclosed. The negative resist composition according to the present invention includes a binder resin consisting of a copolymer including four predetermined monomers, a (meth)acryl monomer including at least 3 (meth)acryl groups, a (meth)acryl monomer including one or two (meth)acryl groups and a photo-initiator. The negative resist composition according to the present invention may be useful to significantly increase the manufacturing yield because it shows an extremely low brittleness during a bonding process or a hot process due to good physical properties such as film retention, pattern stability, adhesion to a substrate, and chemical resistance, as well as good flexibility upon formation of the pattern.