Patents by Inventor Mi Yeon Oh

Mi Yeon Oh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Compound, Non-Aqueous Electrolyte Solution Including the Same, and Lithium Secondary Battery
    Publication number: 20240109858
    Abstract: The present invention relates to a compound capable of lowering the flammability of a non-aqueous electrolyte when included in the non-aqueous electrolyte and improving the life properties of a battery by forming an electrode-electrolyte interface which is stable at high temperatures and low in resistance, and relates to a compound represented by Formula I descried herein, a non-aqueous electrolyte solution and a lithium secondary battery both including the compound, n, m, Ak, and X are described herein.
    Type: Application
    Filed: March 23, 2022
    Publication date: April 4, 2024
    Applicants: LG Chem, Ltd., LG Energy Solution, Ltd.
    Inventors: Jung Keun Kim, Su Jeong Kim, Mi Sook Lee, Won Kyun Lee, Duk Hun Jang, Jeong Ae Yoon, Kyoung Hoon Kim, Chul Haeng Lee, Mi Yeon Oh, Kil Sun Lee, Jung Min Lee, Esder Kang, Chan Woo Noh, Chul Eun Yeom
  • Non-aqueous tungsten compatible metal nitride selective etchants and cleaners
    Patent number: 11319513
    Abstract: Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.
    Type: Grant
    Filed: March 23, 2017
    Date of Patent: May 3, 2022
    Assignee: AVANTOR PERFORMANCE MATERIALS, LLC
    Inventors: Chien-Pin Sherman Hsu, Chun-Yi Sam Chiu, Chu-Hung Wade Wei, Mi Yeon Oh
  • NON-AQUEOUS TUNGSTEN COMPATIBLE METAL NITRIDE SELECTIVE ETCHANTS AND CLEANERS
    Publication number: 20200399565
    Abstract: Provided therefore herein is a novel acidic fluoride activated cleaning chemistry. The present invention includes novel acidic fluoride activated, unique organic-solvent based microelectronic selective etchant/cleaner compositions with high metal nitride etch and broad excellent compatibility, including tungsten (W) and low-k. It does not use W-incompatible oxidizers, such as hydrogen peroxide or particle-generating corrosion inhibitors.
    Type: Application
    Filed: March 23, 2017
    Publication date: December 24, 2020
    Inventors: Chien-Pin Sherman Hsu, Sam Chun-Yi Chiu, Chu-Hung Wade Wei, Mi Yeon Oh