Patents by Inventor Micah Galland

Micah Galland has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining n-well scattering effects on FETs
    Patent number: 7824933
    Abstract: A process is provided for determining the effects of scattering from the edge of a resist during a doping process. Edges of a resist which has been patterned to create an n-well are simulated and individually stepped across a predetermined region in predetermined step sizes. The step sizes may vary from step to step after each step, the scattering effects due to the resist edge at its particular location is determined. A resist of virtually any shape may be divided into its component edges and each edge may be individually stepped during the process.
    Type: Grant
    Filed: March 8, 2005
    Date of Patent: November 2, 2010
    Assignee: International Business Machines Corporation
    Inventors: Micah Galland, Terence B. Hook
  • DEVICE MODELING FOR PROXIMITY EFFECTS
    Publication number: 20080022237
    Abstract: A method for calibrating a software model for a given structure of interest for a variable imposed by an adjacent structure. First determine the spatial extent of the variable imposed by the adjacent structure. Then assign a value to the spatial extent, which varies as a function of distance from the adjacent structure to the given structure. Finally, attach that value to the model of the given structure.
    Type: Application
    Filed: October 3, 2007
    Publication date: January 24, 2008
    Inventors: Eric Adler, Serge Biesemans, Micah Galland, Terence Hook, Judith McCullen, Eric Phipps, James Slinkman
  • METHOD OF DETERMINING N-WELL SCATTERING EFFECTS ON FETS
    Publication number: 20060205098
    Abstract: A process is provided for determining the effects of scattering from the edge of a resist during a doping process. Edges of a resist which has been patterned to create an n-well are simulated and individually stepped across a predetermined region in predetermined step sizes. The step sizes may vary from step to step after each step, the scattering effects due to the resist edge at its particular location is determined. A resist of virtually any shape may be divided into its component edges and each edge may be individually stepped during the process.
    Type: Application
    Filed: March 8, 2005
    Publication date: September 14, 2006
    Applicant: INTERNATIONAL BUSINESS MACHINES CORPORATION
    Inventors: Micah Galland, Terence Hook