Patents by Inventor Michaël Christiaan VAN DER WEKKEN

Michaël Christiaan VAN DER WEKKEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20220082948
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Application
    Filed: November 22, 2021
    Publication date: March 17, 2022
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie CLOIN, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michael Christiaan Van Der Wekken
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 11187991
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Grant
    Filed: September 18, 2015
    Date of Patent: November 30, 2021
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20160011522
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Application
    Filed: September 18, 2015
    Publication date: January 14, 2016
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie CLOIN, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • Lithographic apparatus and a method of operating the apparatus
    Patent number: 9176393
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Grant
    Filed: May 26, 2009
    Date of Patent: November 3, 2015
    Assignee: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie Cloin, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Marco Koert Stavenga, Erik Henricus Egidius Catharina Eummelen, Michel Riepen, Olga Vladimirovna Elisseeva, Tijmen Wilfred Mathijs Gunther, Michaël Christiaan Van Der Wekken
  • LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS
    Publication number: 20090296065
    Abstract: A lithographic projection apparatus is disclosed that includes a table, a shutter member, a fluid handling structure, and a fluid extraction system. The fluid handling structure may be configured to supply and confine liquid between a projection system and (i) a substrate, or (ii) the table, or (iii) a surface of the shutter member, or (iv) a combination selected from (i)-(iii). The surface of the shutter member may adjoin and be co-planar with a surface of the table. The surfaces of the shutter member and the table may be spaced apart by a gap. The fluid extraction system may be configured to remove liquid from the gap.
    Type: Application
    Filed: May 26, 2009
    Publication date: December 3, 2009
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Christian Gerardus Norbertus Hendricus Marie CLOIN, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Marco Koert STAVENGA, Erik Henricus Egidius Catharina EUMMELEN, Michel RIEPEN, Olga Vladimirovna ELISSEEVA, Tijmen Wilfred Mathijs GUNTHER, Michaël Christiaan VAN DER WEKKEN