Patents by Inventor Michael A. Gevelber

Michael A. Gevelber has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integrated airflow control for variable air volume and air handler HVAC systems to reduce building HVAC energy use
    Patent number: 10274217
    Abstract: An airflow system includes a damper apparatus configured to adjust a flow volume of recirculated air and a flow volume of outside air within the airflow system, a variable air volume (VAV) apparatus disposed in fluid communication with the damper apparatus, and a controller disposed in operative communication with the damper apparatus and the VAV apparatus. The controller is configured to determine a percentage of outside air provided to the airflow system by the damper apparatus, determine a minimum flow volume provided by the VAV apparatus of the airflow system, which relates a required flow volume of outside air provided by the VAV apparatus to a zone and the percentage of outside air provided to the airflow system by the damper apparatus, and adjust a flow volume of air provided by the VAV apparatus to the zone based upon the determined minimum flow volume provided by the VAV apparatus.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: April 30, 2019
    Assignee: AEOLUS BUILDING EFFICIENCY
    Inventor: Michael A. Gevelber
  • INTEGRATED AIRFLOW CONTROL FOR VARIABLE AIR VOLUME AND AIR HANDLER HVAC SYSTEMS TO REDUCE BUILDING HVAC ENERGY USE
    Publication number: 20170023269
    Abstract: An airflow system includes a damper apparatus configured to adjust a flow volume of recirculated air and a flow volume of outside air within the airflow system, a variable air volume (VAV) apparatus disposed in fluid communication with the damper apparatus, and a controller disposed in operative communication with the damper apparatus and the VAV apparatus. The controller is configured to determine a percentage of outside air provided to the airflow system by the damper apparatus, determine a minimum flow volume provided by the VAV apparatus of the airflow system, which relates a required flow volume of outside air provided by the VAV apparatus to a zone and the percentage of outside air provided to the airflow system by the damper apparatus, and adjust a flow volume of air provided by the VAV apparatus to the zone based upon the determined minimum flow volume provided by the VAV apparatus.
    Type: Application
    Filed: July 22, 2016
    Publication date: January 26, 2017
    Applicant: Aeolus Building Efficiency
    Inventor: Michael A. Gevelber
  • Method for closed loop control of chemical vapor deposition process
    Patent number: 6162488
    Abstract: The present invention is directed to a method of controlling the application of a surface coating by chemical deposition using a closed loop control on growth rate. The method compares a measure of growth rate against a setpoint for the growth rate and adjusts a primary input parameter in order to drive/maintain the measure of growth rate equal to the setpoint.
    Type: Grant
    Filed: May 14, 1997
    Date of Patent: December 19, 2000
    Assignee: Boston University
    Inventors: Michael A. Gevelber, Manuel Toledo-Quinones
  • Interface angle estimation system
    Patent number: 4943160
    Abstract: An interface angle estimation system comprising thermal and surface imagers and apparatus for determining an interface angle. The imagers provide imaging data to the interface angle determining apparatus, which determines the interface angle.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: July 24, 1990
    Assignee: Massachusetts Institute of Technology
    Inventors: Michael A. Gevelber, Anthony T. Patera
  • Control system for the czochralski process
    Patent number: 4857278
    Abstract: The control system includes a master loop for controlling crystal interface diameter and slave control loops for controlling the melt and the crystal thermal environment. Diameter and meniscus angle signals are partitioned into both a low frequency and a high frequency signal. The low frequency signal is used to adjust the set point of the melt. The higher frequency signal is used to control the crystal pull rate. The crystal control slave loop regulates crystal heat flux which may include following a heat flux trajectory. The heat flux trajectory may also be used to adjust the melt temperature set point.
    Type: Grant
    Filed: July 13, 1987
    Date of Patent: August 15, 1989
    Assignee: Massachusetts Institute Of Technology
    Inventors: Michael A. Gevelber, George Stephanopoulos