Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

Abstract: Kits for polishing sapphire surfaces are disclosed. The kits have compositions including colloidal silica and the colloidal silica has a broad particle size distribution. The kits also include a polishing pad. The polishing pad may include polyurethane impregnated with polyester and it may have a compressibility of about 1% to about 40% and a Shore D hardness of about 50 to about 60.

Abstract: Described herein are methods for polishing sapphire surfaces and compositions for polishing sapphire surfaces. Kits for polishing sapphire surfaces are also disclosed. The kits have compositions including colloidal silica and the colloidal silica has a broad particle size distribution. The kits also include a polishing pad. The polishing pad may include polyurethane impregnated with polyester and it may have a compressibility of about 1% to about 40% and a Shore D hardness of about 50 to about 60.

Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.

Abstract: Compositions and methods of using such compositions for reducing copper ion discharge from aqueous systems is disclosed and claimed. The composition includes a synergistic combination of at least two different benzotriazoles or salts thereof that effectively provides an erosion-resistant barrier on copper-containing surfaces of industrial systems.

Abstract: Compositions and methods of using such compositions for reducing copper ion discharge from aqueous systems is disclosed and claimed. The composition includes a synergistic combination of at least two different benzotriazoles or salts thereof that effectively provides an erosion-resistant barrier on copper-containing surfaces of industrial systems.

Abstract: This invention relates to novel organic phosphonate compounds which can be used as water treatment agents. More specifically, this invention relates to 1,1 -diphosphonic acid N-oxides and water-soluble salts thereof for control of corrosion and scale in aqueous systems. Preferred N-oxides are morpholinomethane-1,1-diphosphonic acid N-oxide and N,N-dimethylaminomethane-1,1-diphosphonic acid N-oxide.

Abstract: The invention is a method for the prevention of scale formation on metal or other surfaces in contact with scale-forming industrial water with an effective scale-inhibiting amount of an ether 1,1-diphosphonate of the general formula: ##STR1## The invention is also a method for the prevention of corrosion on metal surfaces in contact with corrosive industrial water with an effective corrosion-inhibiting amount of an ether 1,1-diphosphonate of the same general formula. A preferred ether 1, 1-diphosphonate is 1,1, diphosphono-4,7-dioxaoctane for both methods.