Patents by Inventor Michael A. Kamrath
Michael A. Kamrath has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 11908673Abstract: An ion molecule reactor for generating analyte ions from analytes comprises: a) a reaction volume in which reagent ions can interact with the analytes in order to form analyte ions; b) at least one analyte inlet for introducing the analytes along an inlet path into the reaction volume whereby, preferably, the inlet path runs essentially along at least a first section of the predefined transit path in the reaction volume; c) at least one reagent ion source and/or at least one reagent ion inlet for providing reagent ions into the reaction volume; d) optionally, at least one ion guide comprising an electrode arrangement which is configured for producing an alternating electrical, magnetic and/or electromagnetic field, that allows for guiding the reagent ions and/or the analyte ions at least along a section of the predefined transit path, preferably along the whole transit path, through the reaction volume.Type: GrantFiled: October 19, 2018Date of Patent: February 20, 2024Assignee: TOFWERK AGInventors: Felipe Lopez-Hilfiker, Manuel Hutterli, Marc Gonin, Carsten Stoermer, Michael Kamrath
-
Patent number: 11908674Abstract: The invention relates to a method for generating a layout of electrodes for an ion guide for transporting ions along an ion path, the ion guide comprising electrodes arranged in the layout of electrodes along the ion path for transporting the ions along the ion path. For generating the layout of electrodes, a layout path corresponding to said the path is assumed and the layout of electrodes is generated along the layout path. The layout of electrodes and the layout path are in reference to a global reference system, wherein the layout of electrodes includes at least two layout subunits which are arranged in succession along the layout path, wherein each one of the at least two layout subunits is of one of at least one layout subunit type. The method includes defining the at least one layout subunit type, wherein each one of the at least one layout subunit type includes type information, the type information being adopted by each layout subunit of the respective one of the at least one layout subunit type.Type: GrantFiled: May 27, 2021Date of Patent: February 20, 2024Assignee: TOFWERK AGInventors: Stephan Graf, Michael Kamrath
-
Patent number: 11605532Abstract: The invention relates to a method for, in an ion guide (10), modulating a stream of ions according to a modulation function, wherein the stream of ions includes at least N different ion species, wherein N is at least 1. This ion guide (10) forms an ion guide path, wherein the ions of the stream of ions are conveyed along the ion guide path in a conveying direction to form the stream of ions. The ion guide (10) includes an ion gate (12) arranged at an ion gate position on the ion guide path, wherein the ion gate (12) is adapted to provide an open state for allowing the ions passing the ion gate position when being conveyed along the ion guide path and a closed state for preventing the ions from passing the ion gate position.Type: GrantFiled: May 27, 2021Date of Patent: March 14, 2023Assignee: TOFWERK AGInventors: Stephan Graf, Michael Kamrath, Sebastian Gerber
-
Publication number: 20220384172Abstract: The invention relates to a method for, in an ion guide (10), modulating a stream of ions according to a modulation function, wherein the stream of ions includes at least N different ion species, wherein N is at least 1. This ion guide (10) forms an ion guide path, wherein the ions of the stream of ions are conveyed along the ion guide path in a conveying direction to form the stream of ions. The ion guide (10) includes an ion gate (12) arranged at an ion gate position on the ion guide path, wherein the ion gate (12) is adapted to provide an open state for allowing the ions passing the ion gate position when being conveyed along the ion guide path and a closed state for preventing the ions from passing the ion gate position.Type: ApplicationFiled: May 27, 2021Publication date: December 1, 2022Applicant: TOFWERK AGInventors: Stephan GRAF, Michael KAMRATH, Sebastian GERBER
-
Publication number: 20220005683Abstract: The invention relates to a method for generating a layout of electrodes for an ion guide for transporting ions along an ion path, the ion guide comprising electrodes arranged in the layout of electrodes along the ion path for transporting the ions along the ion path. For generating the layout of electrodes, a layout path corresponding to said the path is assumed and the layout of electrodes is generated along the layout path. The layout of electrodes and the layout path are in reference to a global reference system, wherein the layout of electrodes includes at least two layout subunits which are arranged in succession along the layout path, wherein each one of the at least two layout subunits is of one of at least one layout subunit type. The method includes defining the at least one layout subunit type, wherein each one of the at least one layout subunit type includes type information, the type information being adopted by each layout subunit of the respective one of the at least one layout subunit type.Type: ApplicationFiled: May 27, 2021Publication date: January 6, 2022Applicant: TOFWERK AGInventors: Stephan GRAF, Michael KAMRATH
-
Publication number: 20200243317Abstract: An ion molecule reactor for generating analyte ions from analytes comprises: a) a reaction volume in which reagent ions can interact with the analytes in order to form analyte ions; b) at least one analyte inlet for introducing the analytes along an inlet path into the reaction volume whereby, preferably, the inlet path runs essentially along at least a first section of the predefined transit path in the reaction volume; c) at least one reagent ion source and/or at least one reagent ion inlet for providing reagent ions into the reaction volume; d) optionally, at least one ion guide comprising an electrode arrangement which is configured for producing an alternating electrical, magnetic and/or electromagnetic field, that allows for guiding the reagent ions and/or the analyte ions at least along a section of the predefined transit path, preferably along the whole transit path, through the reaction volume.Type: ApplicationFiled: October 19, 2018Publication date: July 30, 2020Applicant: TOFWERK AGInventors: Felipe LOPEZ-HILFIKER, Manuel HUTTERLI, Marc GONIN, Carsten STOERMER, Michael KAMRATH
-
Patent number: 9896604Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.Type: GrantFiled: March 12, 2014Date of Patent: February 20, 2018Assignee: ECOLAB USA INC.Inventors: Kim Marie Long, Michael A. Kamrath, Sean McCue
-
Patent number: 9446493Abstract: Kits for polishing sapphire surfaces are disclosed. The kits have compositions including colloidal silica and the colloidal silica has a broad particle size distribution. The kits also include a polishing pad. The polishing pad may include polyurethane impregnated with polyester and it may have a compressibility of about 1% to about 40% and a Shore D hardness of about 50 to about 60.Type: GrantFiled: February 3, 2016Date of Patent: September 20, 2016Assignee: ECOLAB USA Inc.Inventors: Kim Marie Long, Michael A. Kamrath, Sean P. McCue
-
Publication number: 20160151876Abstract: Described herein are methods for polishing sapphire surfaces and compositions for polishing sapphire surfaces. Kits for polishing sapphire surfaces are also disclosed. The kits have compositions including colloidal silica and the colloidal silica has a broad particle size distribution. The kits also include a polishing pad. The polishing pad may include polyurethane impregnated with polyester and it may have a compressibility of about 1% to about 40% and a Shore D hardness of about 50 to about 60.Type: ApplicationFiled: February 3, 2016Publication date: June 2, 2016Applicant: ECOLAB USA INC.Inventors: Kim Marie Long, Michael A. Kamrath, Sean P. McCue
-
Patent number: 9283648Abstract: Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.Type: GrantFiled: August 23, 2013Date of Patent: March 15, 2016Assignee: ECOLAB USA Inc.Inventors: Kim Marie Long, Michael Kamrath, Sean McCue
-
Publication number: 20140263170Abstract: Described herein are compositions, kits and methods for polishing sapphire surfaces using compositions having colloidal aluminosilicate particles in an aqueous acidic solution. In some aspects, the methods for polishing a sapphire surface may include abrading a sapphire surface with a rotating polishing pad and a polishing composition. The polishing composition may include an amount of a colloidal aluminosilicate and may have a pH of about 2.0 to about 7.0.Type: ApplicationFiled: March 12, 2014Publication date: September 18, 2014Applicant: ECOLAB USA INC.Inventors: Kim Marie Long, Michael A. Kamrath, Sean McCue
-
Publication number: 20140057532Abstract: Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.Type: ApplicationFiled: August 23, 2013Publication date: February 27, 2014Inventors: Kim Marie Long, Michael Kamrath
-
Publication number: 20140057533Abstract: Described herein are methods for polishing sapphire surfaces using compositions comprising colloidal silica, wherein the colloidal silica has a broad particle size distribution.Type: ApplicationFiled: August 23, 2013Publication date: February 27, 2014Inventors: Kim Marie Long, Michael Kamrath, Sean McCue
-
Patent number: 8470238Abstract: Compositions and methods of using such compositions for reducing copper ion discharge from aqueous systems is disclosed and claimed. The composition includes a synergistic combination of at least two different benzotriazoles or salts thereof that effectively provides an erosion-resistant barrier on copper-containing surfaces of industrial systems.Type: GrantFiled: November 20, 2008Date of Patent: June 25, 2013Assignee: Nalco CompanyInventors: Kaveh Sotoudeh, Michael A. Kamrath, Jasbir S. Gill
-
Publication number: 20100123100Abstract: Compositions and methods of using such compositions for reducing copper ion discharge from aqueous systems is disclosed and claimed. The composition includes a synergistic combination of at least two different benzotriazoles or salts thereof that effectively provides an erosion-resistant barrier on copper-containing surfaces of industrial systems.Type: ApplicationFiled: November 20, 2008Publication date: May 20, 2010Inventors: Jasbir S. Gill, Michael A. Kamrath, Kaveh Sotoudeh
-
Patent number: 6083403Abstract: This invention relates to novel organic phosphonate compounds which can be used as water treatment agents. More specifically, this invention relates to 1,1 -diphosphonic acid N-oxides and water-soluble salts thereof for control of corrosion and scale in aqueous systems. Preferred N-oxides are morpholinomethane-1,1-diphosphonic acid N-oxide and N,N-dimethylaminomethane-1,1-diphosphonic acid N-oxide.Type: GrantFiled: November 5, 1998Date of Patent: July 4, 2000Assignee: Nalco Chemical CompanyInventors: Jiansheng Tang, Michael A. Kamrath
-
Patent number: 5772893Abstract: The invention is a method for the prevention of scale formation on metal or other surfaces in contact with scale-forming industrial water with an effective scale-inhibiting amount of an ether 1,1-diphosphonate of the general formula: ##STR1## The invention is also a method for the prevention of corrosion on metal surfaces in contact with corrosive industrial water with an effective corrosion-inhibiting amount of an ether 1,1-diphosphonate of the same general formula. A preferred ether 1, 1-diphosphonate is 1,1, diphosphono-4,7-dioxaoctane for both methods.Type: GrantFiled: August 13, 1996Date of Patent: June 30, 1998Assignee: NALCO Chemical CompanyInventors: Peter E. Reed, Michael A. Kamrath, Phillip W. Carter, Ronald V. Davis