Abstract: An electrical socket shim assembly for inhibiting an electrical plug from freely moving in an electrical socket includes a plurality of shims and each of the shims has a first lateral side and a second lateral side. Moreover, each of the shims is concavely arcuate between the first lateral side and the second lateral side thereby facilitating each of the shims to be positioned between a corresponding circular electrical plug and a corresponding circular electrical socket. Each of the shims has a unique thickness with respect to each other for occupying a unique amount of space in the corresponding circular electrical socket. A plurality of tabs is provided and each of the tabs is coupled to a respective one of the shims. Each of the tabs is secured to a support when the respective shim is positioned between the corresponding circular electrical plug in the corresponding circular electrical socket. In this way the respective shim is inhibited from being removed from the corresponding electrical socket.

Abstract: A cushioning guitar strap reduces unit load on the shoulder by the use of a relatively wide cushioning pad formed with a soft flexible foam layer to conform to a user's shoulder under the load of a guitar, with a flexible film, which is dimensionally stable in use under the load of a guitar, bonded to the foam layer to transfer the load over the area of the pad. Front and back straps connected to the cushioning pad each have a quick connect-disconnect adjustment mechanism permitting adjustment of strap length while the guitar strap is in use over the shoulder supporting a guitar.

Abstract: An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).

Abstract: An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).

Abstract: An emitted energy system for use in photolithography may include a holder assembly operable to precisely align a diffuser and a nozzle. In accordance with one embodiment of the present invention, a holder assembly (30) may comprise a nozzle mounting system (414) coupled to a housing assembly (400) to secure a nozzle (22). A diffuser mounting system (430) may be coupled to the housing assembly (400) to secure a diffuser (28). An alignment system (450) may operate to align the nozzle (22) and the diffuser (28) in a spatial relationship with each other to optimize operation of the diffuser (28) in relation to the nozzle (22).