Patents by Inventor Michael A. Retersdorf

Michael A. Retersdorf has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8239151
    Abstract: A method, apparatus, and a system for generating a binary mapping of wafer regions using measured value. A first measured value relating to processing a first workpiece is acquired. A second measured value relating to a second workpiece is acquired. At least a first region common to the first and second workpieces is defined. A determination is made as to whether the results associated with the first or second measured value is above a predetermined threshold. A first binary value is assigned to the first region based upon a determination that the results associated the first or second measured value data is above the threshold.
    Type: Grant
    Filed: January 28, 2011
    Date of Patent: August 7, 2012
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Michael G. McIntyre, Michael A. Retersdorf
  • Patent number: 7983871
    Abstract: A method includes determining at least a first characteristic of a device during a first test insertion and storing the first characteristic. The device is identified during a second test insertion. The first characteristic is retrieved responsive to the identification of the device. A test program for the second insertion is configured based on the first characteristic. The configured test program is executed to test the device during the second test insertion.
    Type: Grant
    Filed: September 4, 2007
    Date of Patent: July 19, 2011
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Douglas C. Kimbrough, Michael A. Retersdorf, Kevin R. Lensing
  • Patent number: 7974724
    Abstract: A method, apparatus, and a system for performing a product feedback for process control are provided. Metrology data relating to a first workpiece is received. An end of line parameter relating to the first workpiece is received. The end of line parameter is correlated with the metrology data. A process control associated with a plurality of processes to be performed on a second workpiece is adjusted based upon the correlating.
    Type: Grant
    Filed: December 29, 2009
    Date of Patent: July 5, 2011
    Assignee: GlobalFoundries, Inc.
    Inventor: Michael A. Retersdorf
  • Publication number: 20110137597
    Abstract: A method, apparatus, and a system for generating a binary mapping of wafer regions using measured value. A first measured value relating to processing a first workpiece is acquired. A second measured value relating to a second workpiece is acquired. At least a first region common to the first and second workpieces is defined. A determination is made as to whether the results associated with the first or second measured value is above a predetermined threshold. A first binary value is assigned to the first region based upon a determination that the results associated the first or second measured value data is above the threshold.
    Type: Application
    Filed: January 28, 2011
    Publication date: June 9, 2011
    Inventors: Michael G. McIntyre, Michael A. Retersdorf
  • Patent number: 7899634
    Abstract: A method, apparatus, and a system for generating a binary mapping of wafer regions using measured value. A first measured value relating to processing a first workpiece is acquired. A second measured value relating to a second workpiece is acquired. At least a first region common to the first and second workpieces is defined. A determination is made as to whether the results associated with the first or second measured value is above a predetermined threshold. A first binary value is assigned to the first region based upon a determination that the results associated the first or second measured value data is above the threshold.
    Type: Grant
    Filed: November 7, 2005
    Date of Patent: March 1, 2011
    Assignee: Advanced Micro Devices, Inc.
    Inventors: Michael G. McIntyre, Michael A. Retersdorf
  • Publication number: 20100106278
    Abstract: A method, apparatus, and a system for performing a product feedback for process control are provided. Metrology data relating to a first workpiece is received. An end of line parameter relating to the first workpiece is received. The end of line parameter is correlated with the metrology data. A process control associated with a plurality of processes to be performed on a second workpiece is adjusted based upon the correlating.
    Type: Application
    Filed: December 29, 2009
    Publication date: April 29, 2010
    Inventor: Michael A. Retersdorf
  • Patent number: 7657339
    Abstract: A method, apparatus, and a system for performing a product feedback for process control are provided. Metrology data relating to a first workpiece is received. An end of line parameter relating to the first workpiece is received. The end of line parameter is correlated with the metrology data. A process control associated with a plurality of processes to be performed on a second workpiece is adjusted based upon the correlating.
    Type: Grant
    Filed: October 14, 2005
    Date of Patent: February 2, 2010
    Assignee: GlobalFoundries, Inc.
    Inventor: Michael A. Retersdorf
  • Publication number: 20090058449
    Abstract: A method includes determining at least a first characteristic of a device during a first test insertion and storing the first characteristic. The device is identified during a second test insertion. The first characteristic is retrieved responsive to the identification of the device. A test program for the second insertion is configured based on the first characteristic. The configured test program is executed to test the device during the second test insertion.
    Type: Application
    Filed: September 4, 2007
    Publication date: March 5, 2009
    Inventors: Douglas C. Kimbrough, Michael A. Retersdorf, Kevin R. Lensing