Patents by Inventor Michael Albiez
Michael Albiez has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20220280983Abstract: The invention relates to a high pressure cleaning system including a high pressure cleaning appliance operable with at least one variable operating parameter that has a pump assembly, at least one accessory that is in or is bringable into flow connection with a high pressure outlet of the pump assembly, an input unit, at least one control unit coupled to the input unit, and an output unit coupled to the at least one control unit, wherein an object to be cleaned is specifiable by the input unit and a cleaning recommendation is providable on the output unit by the at least one control unit in dependence on the specification, and wherein at least one interaction element is provided for the user, linked to the cleaning recommendation, on the output unit for transmitting interaction information to the at least one control unit, in particular in dependence on the cleaning recommendation.Type: ApplicationFiled: January 28, 2022Publication date: September 8, 2022Inventors: Andreas Friederich, Michael Albiez, Tobias Masek, Timo Spengler, Angelika Mohr
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Patent number: 11276547Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: GrantFiled: October 23, 2020Date of Patent: March 15, 2022Assignee: Carl Zeiss Microscopy GmbHInventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 11139140Abstract: A particle beam apparatus includes a first aperture unit having an adjustable aperture opening. The particle beam apparatus may include a first condenser lens having a first pole shoe and a second pole shoe. Both the first pole shoe and the second pole shoe may be adjustable relative to a second aperture unit independently of each other. The second aperture unit may be designed as a pressure stage aperture separating a first area having a vacuum at a first pressure, and a second area having a vacuum at a second pressure. Additionally, a method for adjusting a beam current in a particle beam apparatus is provided.Type: GrantFiled: July 22, 2010Date of Patent: October 5, 2021Assignee: Carl Zeiss Microscopy GmbHInventors: Dirk Preikszas, Michael Albiez
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Publication number: 20210050178Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: ApplicationFiled: October 23, 2020Publication date: February 18, 2021Inventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 10861670Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: GrantFiled: December 23, 2019Date of Patent: December 8, 2020Assignee: Carl Zeiss Microscopy GmbHInventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Publication number: 20200135425Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: ApplicationFiled: December 23, 2019Publication date: April 30, 2020Inventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 10522321Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: GrantFiled: July 27, 2018Date of Patent: December 31, 2019Assignee: Carl Zeiss Microscopy GmbHInventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Publication number: 20180342368Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: ApplicationFiled: July 27, 2018Publication date: November 29, 2018Inventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 10068744Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: GrantFiled: December 1, 2015Date of Patent: September 4, 2018Assignee: Carl Zeiss Microscopy GmbHInventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 9741528Abstract: Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an object. The object is accommodated in a pressure-controlled interior of a specimen chamber during the inspection of the object. The charged particle optical apparatus further includes a differential pressure module having a differential pressure aperture. A positioning arm is arranged in the specimen chamber for selectively position the differential pressure module within the pressure-controlled interior of the specimen chamber into an operating position in which the particle beam path passes through the differential pressure aperture. The selective positioning includes an advancing movement of the differential pressure module toward the primary particle beam path. The advancing movement is transmitted to the differential pressure module by a track-guided movement of the positioning arm.Type: GrantFiled: May 28, 2015Date of Patent: August 22, 2017Assignee: CARL ZEISS MICROSCOPY GMBHInventors: Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean, Erik Essers
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Publication number: 20170154752Abstract: Disclosed is a charged particle optical apparatus. The charged particle optical apparatus has a liner electrode in a first vacuum zone. The liner electrode is used to generate an electrostatic objective lens field. The apparatus has a second electrode which surrounds at least a section of the primary particle beam path. The section extends in the first vacuum zone and downstream of the liner electrode. A third electrode is provided having a differential pressure aperture through which the particle beam path exits from the first vacuum zone. A particle detector is configured for detecting emitted particles, which are emitted from the object and which pass through the differential pressure aperture of the third electrode. The liner electrode, the second and third electrodes are operable at different potentials relative to each other.Type: ApplicationFiled: December 1, 2015Publication date: June 1, 2017Inventors: Erik Essers, Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 9354188Abstract: A particle beam device, in particular an electron beam device, is provided having a beam generator for generating a primary particle beam, an objective lens for focusing the primary particle beam onto an object, and a detector for detecting particles emitted by the object. The objective lens has at least one magnetic unit, with the magnetic unit generating at least one first crossover and at least one second crossover. The first crossover is arranged in the objective lens or in a region between the objective lens and the object. The second crossover is arranged at the object. The device permits the examination of the object using particles which have a low energy, with good imaging properties. A method for operating the particle beam device is also provided.Type: GrantFiled: September 6, 2013Date of Patent: May 31, 2016Assignee: Carl Zeiss Microscopy GmbHInventor: Michael Albiez
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Publication number: 20150348742Abstract: Disclosed is a charged particle optical apparatus, which includes a particle optical arrangement, configured to define a particle beam path for inspecting an object. The object is accommodated in a pressure-controlled interior of a specimen chamber during the inspection of the object. The charged particle optical apparatus further includes a differential pressure module having a differential pressure aperture. A positioning arm is arranged in the specimen chamber for selectively position the differential pressure module within the pressure-controlled interior of the specimen chamber into an operating position in which the particle beam path passes through the differential pressure aperture. The selective positioning includes an advancing movement of the differential pressure module toward the primary particle beam path. The advancing movement is transmitted to the differential pressure module by a track-guided movement of the positioning arm.Type: ApplicationFiled: May 28, 2015Publication date: December 3, 2015Inventors: Michael Albiez, Stefan Meyer, Daniel Kirsten, Stewart Bean
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Patent number: 8779381Abstract: An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.Type: GrantFiled: September 19, 2011Date of Patent: July 15, 2014Assignee: Carl Zeiss NTS GmbHInventors: Matthias Lang, Ulrike Zeile, Michael Albiez, Wolfram Bühler
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Publication number: 20140070097Abstract: A particle beam device, in particular an electron beam device, is provided having a beam generator for generating a primary particle beam, an objective lens for focusing the primary particle beam onto an object, and a detector for detecting particles emitted by the object. The objective lens has at least one magnetic unit, with the magnetic unit generating at least one first crossover and at least one second crossover. The first crossover is arranged in the objective lens or in a region between the objective lens and the object. The second crossover is arranged at the object. The device permits the examination of the object using particles which have a low energy, with good imaging properties. A method for operating the particle beam device is also provided.Type: ApplicationFiled: September 6, 2013Publication date: March 13, 2014Applicant: Carl Zeiss Microscopy GmbHInventor: Michael Albiez
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Patent number: 8481933Abstract: A method for treating a surface of an object and a device suitable in particular for performing this method provide for examining the surface of the object with the aid of a particle beam to counteract the charge buildup on the object. A gas is supplied to convey the charge away from the surface and/or to neutralize it.Type: GrantFiled: July 14, 2009Date of Patent: July 9, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Michael Albiez, Wolfram Buhler
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Patent number: 8450215Abstract: An inspection method comprises focusing a particle beam onto a sample; operating at least one detector located close to the sample; assigning detection signals generated by the at least one detector to different intensity intervals; determining, based on the detection signals assigned to the intensity intervals, at least one first signal component related to electrons incident on the detector; and determining, based on the detection signals assigned to the intensity intervals, at least one second signal component related to X-rays incident on the detector.Type: GrantFiled: August 5, 2010Date of Patent: May 28, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Hubert Mantz, Rainer Arnold, Michael Albiez
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Patent number: 8368019Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.Type: GrantFiled: September 28, 2011Date of Patent: February 5, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Hubert Mantz, Rainer Arnold, Michael Albiez
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Patent number: 8368020Abstract: A particle beam system comprises a particle beam source 5 for generating a primary particle beam 13, an objective lens 19 for focusing the primary particle beam 13 in an object plane 23; a particle detector 17; and an X-ray detector 47 arranged between the objective lens and the object plane. The X-ray detector comprises plural semiconductor detectors, each having a detection surface 51 oriented towards the object plane. A membrane is disposed between the object plane and the detection surface of the semiconductor detector, wherein different semiconductor detectors have different membranes located in front, the different membranes differing with respect to a secondary electron transmittance.Type: GrantFiled: September 28, 2011Date of Patent: February 5, 2013Assignee: Carl Zeiss Microscopy GmbHInventors: Hubert Mantz, Rainer Arnold, Michael Albiez
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Publication number: 20120112089Abstract: An aperture unit for a particle beam device, in particular an electron beam device, is disclosed. Deposit supporting units are arranged at the aperture unit, with which deposit supporting units contaminations can be bound in such a way that the contaminations can no longer deposit at an aperture opening of the aperture unit. Coatings which can be arranged on the aperture unit make it possible to reduce interactions which cause contaminations to deposit at the aperture opening.Type: ApplicationFiled: September 19, 2011Publication date: May 10, 2012Inventors: Matthias Lang, Ulrike Zeile, Michael Albiez, Wolfram Bühler