Abstract: An intraocular lens comprises an optic and two or more haptics, wherein the optic is convexo-concave, i.e. both faces are curved in the same sense with respect to the plane defined by the rim of the optic, wherein the haptics lie at an angle with respect to said plane and on the same side thereof as the optic's faces, and wherein each haptic has a smooth, undulating radially outer edge.

Abstract: An intraocular lens comprises an optic and two or more haptics, wherein the optic is convexo-concave, i.e. both faces are curved in the same sense with respect to the plane defined by the rim of the optic, wherein the haptics lie at an angle with respect to said plane and on the same side thereof as the optic's faces, and wherein each haptic has a smooth, undulating radially outer edge.

Abstract: A method of producing a biocompatible prosthesis based on a substrate made essentially of metal or ceramic. The substrate is placed into a reactor chamber of a cathodic vapor deposition arrangement and the chamber is evacuated to a predetermined pressure. A predetermined, negative bias voltage is then applied to the substrate and the substrate is surface treated by adding an etching gas to the reactor chamber, at a predetermined, first flow rate and coupling in a high frequency power with a first, predetermined power density for ionic etching for a first, predetermined period of time. The surface treated substrate is separated from the negative bias voltage and a semiconductor cover layer is chemical vapor-phase deposited on the substrate by adding to the reactor chamber a multi-component mixture of process gases containing a semiconductor element in bound form at a second, predetermined flow rate and coupling-in of HF power with a predetermined, second power density, for a second, predetermined time period.

Abstract: A method of producing a biocompatible prosthesis based on a substrate made essentially of metal or ceramic. The substrate is placed into a reactor chamber of a cathodic vapor deposition arrangement and the chamber is evacuated to a predetermined pressure. A predetermined, negative bias voltage is then applied to the substrate and the substrate is surface treated by adding an etching gas to the reactor chamber, at a predetermined, first flow rate and coupling in a high frequency power with a first, predetermined power density for ionic etching for a first, predetermined period of time. The surface treated substrate is separated from the negative bias voltage and a semiconductor cover layer is chemical vapor-phase deposited on the substrate by adding to the reactor chamber a multi-component mixture of process gases containing a semiconductor element in bound format a second, predetermined flow rate and coupling-in of HF power with a predetermined, second power density, for a second, predetermined time period.

Abstract: A method of attaching heparin to, and immobilizing it on, inorganic substrate surfaces of cardiovascular implants such as cardiac valves or alloplastic vessel wall supports, comprising the following steps:activation of the inorganic substrate surface by etching,attachment, by exposure to ultraviolet light, of a photoactive benzophenone compound with an amino protective group as a spacer to the activated substrate surface,splitting off of the amino protective group by the aid of a non-aqueous piperidine solution, andcovalent peptide-bonding of heparin to the free and reactive amino groups of the substrate surface by an aqueous heparin solution acting on the amino groups.