Abstract: A tire and wheel assembly includes a tire, a circular hub member for securing to a rotatable axle of a vehicle, the rim piece having a first annular ring flange for engaging the tire, a rim piece for engaging the hub member, a second annular ring flange for engaging the tire, and a plurality of cylindrical shafts for each axially engaging the first annular ring flange at one axial end of each of the shafts and the second annular ring flange at another opposite axial end of each of the shafts.

Abstract: Embodiments disclosed herein include to a component support for use in coating chamber components via chemical vapor deposition (CVD). The component support includes contact rods configured to contact chamber components at fixture points located on the backside of the chamber components. The component supports are configured to support the chamber components in the processing volume with minimal contact of the chamber components. The fixture points on the backside reduce exposure of the fixture points to reactant gases when the chamber components are installed.

Abstract: A susceptor for use in a processing chamber for supporting a wafer includes a susceptor substrate having a susceptor ledge on an outer circumferential edge of a front side of the susceptor substrate, wherein a pocket within the susceptor ledge is configured to hold a wafer to be processed in a processing chamber, and a coating layer deposited on the susceptor substrate, wherein a surface of the susceptor ledge is textured with a plurality of venting groove lines, a surface of the pocket is textured with a first pattern, and a surface of a back side of the susceptor substrate opposite the front side is textured with a second pattern.

Abstract: A substrate support assembly and processing chamber having the same are disclosed herein. In one embodiment, a substrate support assembly is provided that includes a body. The body has a center, an outer perimeter connecting a substrate support surface and a backside surface. The body additionally has a pocket disposed on the substrate support surface at the center and a lip disposed between the pocket and the outer perimeter. A layer is formed in the pocket of the substrate support surface. A plurality of discreet islands are disposed in the layer, wherein the discreet islands are disposed about a center line extending perpendicular from the substrate support surface.

Abstract: Systems and apparatus for a reduced mass substrate support are disclosed, according to certain embodiments. A front side pocket is provided for support of a substrate, while a backside pocket is provided that reduces the mass of the substrate support. By providing the backside pocket, the mass of the overall substrate support is reduced, providing faster thermal cycling times for the substrate support and reducing the weight of the substrate support for transport. Lift pin systems, according to disclosed embodiments, are compatible with existing pedestal systems by providing a hollow extension from each lift pin hole that extends from a bottom of the backside pocket to provide support for lift pin insertion and operation.

Abstract: The present invention relates generally to the field of garment fabrics. More specifically, the present invention relates to an insulated garment fabric device comprised of a front layer, a rear layer and a middle layer between the front and rear layer. The front and rear layers are preferably manufactured from a fabric material. The middle layer is preferably manufactured from an insulated material such as, but not limited to, biaxially-oriented polyethylene terephthalate or heat conducting-foil. The front and rear layers may further be comprised of indicia and may be infused with a plurality of compounds. In addition, the device is comprised of a method of manufacture and use, wherein the device can be used to make garments and other objects such as, but not limited to: blankets.

Abstract: A susceptor for use in a processing chamber for supporting a wafer includes a susceptor substrate having a front side and a back side opposite the front side, and a coating layer deposited on the susceptor substrate. The front side has a pocket configured to hold a wafer to be processed in a processing chamber, the pocket being textured with a first pattern. The back side is textured with a second pattern.

Abstract: A method is described for presenting a report. The method comprises the following steps. Survey results are obtained to plurality of customer surveys for a predefined location over a data accumulation period. Each customer survey includes a plurality of attributes each having at least one weighting factor. A location average result is calculated for each of the plurality of attributes. Survey results are obtained to a plurality of peer surveys over the data accumulation period for at least one corresponding peer. Each peer survey including a plurality of attributes. Calculating a peer average result for each of the plurality of attributes. A peer difference score is determined for each of the attributes as a difference between the location average result and the peer average result for the corresponding attribute. A ranking score is determined for each attribute based on a combination of the at least one weighting factor and the peer difference score.