Abstract: A kit of parts for forming a foreline for coupling a process chamber to a vacuum pumping and/or abatement system, the kit comprising: a plurality of foreline segments; wherein each foreline segment is a pipe that comprises: a first substantially straight end portion; a second substantially straight end portion opposite to the first end portion; and an intermediate portion disposed between the first and second end portions and connected to the first and second end portions by respective bends; the first and second end portions are substantially parallel to each other; the intermediate portion is oblique to the first and second end portions; and the foreline segments are configured to be attached together so as to form a continuous foreline.

Abstract: A drag pump for pumping fluid from an inlet to an outlet includes a stator and a rotor. One of the stator or rotor includes a disc having a plurality of channels each of the channels extending from an inlet portion of the disc at or close to an inlet edge towards an outlet portion at or close to an outlet edge. The plurality of channels each has walls for guiding fluid flow from the inlet edge to the outlet edge in response to relative motion between the stator and the rotor. The disc further includes a plurality of protrusions extending from the channels, each of the protrusions being arranged to divide a channel at the inlet or the outlet end of the channel, into sub-channels that extend for a portion of a length of the channel and do not extend for a whole length of the channel.

Abstract: A vacuum exhaust system includes a plurality of turbo pumps that evacuate a plurality of vacuum chambers. A plurality of chamber valves are positioned between the turbo pumps and the plurality of vacuum chambers. A plurality of branch channels are each connected to a corresponding exhaust of the plurality of turbo pumps and a main channel is formed from a confluence of the branch channels. A booster vacuum pump is connected to the main channel. A backing vacuum pump is connected to an exhaust of the booster vacuum pump. A plurality of bypass channels, each having a valve, provide a fluid communication path between at least some of the plurality of vacuum chambers and the booster vacuum pump.

Abstract: A kit of parts for forming a foreline for coupling a process chamber to a vacuum pumping and/or abatement system, the kit comprising: a plurality of foreline segments; wherein each foreline segment is a pipe that comprises: a first substantially straight end portion; a second substantially straight end portion opposite to the first end portion; and an intermediate portion disposed between the first and second end portions and connected to the first and second end portions by respective bends; the first and second end portions are substantially parallel to each other; the intermediate portion is oblique to the first and second end portions; and the foreline segments are configured to be attached together so as to form a continuous foreline.

Abstract: A drag pump for pumping fluid from an inlet to an outlet includes a stator and a rotor. One of the stator or rotor includes a disc having a plurality of channels each of the channels extending from an inlet portion of the disc at or close to an inlet edge towards an outlet portion at or close to an outlet edge. The plurality of channels each has walls for guiding fluid flow from the inlet edge to the outlet edge in response to relative motion between the stator and the rotor. The disc further includes a plurality of protrusions extending from the channels, each of the protrusions being arranged to divide a channel at the inlet or the outlet end of the channel, into sub-channels that extend for a portion of a length of the channel and do not extend for a whole length of the channel.

Abstract: A vacuum exhaust system includes a plurality of low pressure vacuum pumps that operate in a molecular flow region and evacuate a plurality of vacuum chambers. A plurality of chamber valves are positioned between the low pressure vacuum pumps and the plurality of vacuum chambers. A plurality of branch channels are each connected to a corresponding exhaust of the plurality of low pressure vacuum pumps and a main channel is formed from a confluence of the branch channels. An intermediate vacuum pump is connected to the main channel and operates in a viscous flow region. A higher pressure vacuum pump operates in a higher pressure viscous flow region and is connected to an exhaust of the intermediate pressure vacuum pump. A plurality of bypass channels, each having a valve, provide a fluid communication path between at least some of the plurality of vacuum chambers and a higher pressure vacuum pump.

Abstract: A vacuum pumping arrangement comprises a first pump which has a first inlet and a first outlet. The first inlet is fluidly connected to a first common pumping line. The first common pumping line includes a plurality of first pumping line inlets each of which is fluidly connectable to a least one process chamber within a group of process chambers that form a semiconductor fabrication tool. The vacuum pumping arrangement also includes a reserve pump which has a reserve inlet and a reserve outlet. The reserve inlet is selectively fluidly connectable to each process chamber within the group of process chambers that form the semiconductor fabrication tool. The vacuum pumping arrangement additionally includes a controller which is configured to selectively fluidly isolate the pump from one or more given process chambers and selectively fluidly connect the reserve pump with the said one or more given process chambers.

Abstract: A vacuum pumping arrangement comprises a first pump which has a first inlet and a first outlet. The first inlet is fluidly connected to a first common pumping line. The first common pumping line includes a plurality of first pumping line inlets each of which is fluidly connectable to a least one process chamber within a group of process chambers that form a semiconductor fabrication tool. The vacuum pumping arrangement also includes a reserve pump which has a reserve inlet and a reserve outlet. The reserve inlet is selectively fluidly connectable to each process chamber within the group of process chambers that form the semiconductor fabrication tool. The vacuum pumping arrangement additionally includes a controller which is configured to selectively fluidly isolate the pump from one or more given process chambers and selectively fluidly connect the reserve pump with the said one or more given process chambers.

Abstract: The present invention relates to a vacuum system for evacuating a chamber of a metallurgical processing system. The system comprises a vacuum pumping arrangement for evacuating gas from the chamber, a foreline connecting the vacuum pumping arrangement to the chamber, a filter volume located in the foreline for filtering gas evacuated from the chamber along the foreline, and a by-pass line connecting the vacuum pumping arrangement to the chamber and arranged to by-pass the filter volume selectively dependent on monitored characteristics of the degassing chamber or the vacuum system.

Abstract: The present invention relates to a vacuum system 10 for evacuating a chamber 10 of a metallurgical processing system. The system comprises a vacuum pumping arrangement 14 for evacuating gas from the chamber, a foreline connecting the vacuum pumping arrangement to the chamber, a filter volume located in the foreline 16 for filtering gas evacuated from the chamber along the foreline, and a by-pass line 20 connecting the vacuum pumping arrangement to the chamber and arranged to by-pass the filter volume selectively dependent on monitored characteristics of the degassing chamber or the vacuum system.

Abstract: The present invention relates to a vacuum pumping system (10) for evacuating a vacuum chamber (12), the system comprising: a vacuum pump (16); and a plurality of forelines (22, 24) for conveying gas to the vacuum pump wherein in a first low vacuum stage of chamber evacuation a first foreline arrangement (22) can be connected for conveying gas to the vacuum pump and in a second higher vacuum stage of chamber evacuation a second foreline arrangement (22, 24) comprising one or more of said forelines can be connected for conveying gas to the vacuum pump, wherein the second foreline arrangement has a total cross-sectional area for conveying fluid which is larger than a total cross-sectional area of the first foreline arrangement.

Abstract: A system for evacuating an enclosure is provided. The system includes a first vacuum pump having an inlet selectively connectable to an outlet from the enclosure. A second vacuum pump is also provided together with a conduit for connecting an exhaust of the first vacuum pump to an inlet of the second vacuum pump. An auxiliary chamber is provided, this chamber being selectively connectable to the conduit such that, in a first state, gas can be drawn from the auxiliary chamber by the second vacuum pump in isolation from the enclosure, and, in a second state, gas can be drawn from the enclosure to the auxiliary chamber through the first vacuum pump.

Abstract: A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.

Abstract: A method is described of treating a gas stream exhausted from an atomic layer deposition (ALD) process chamber to which two or more gaseous precursors are alternately supplied. Between the process chamber and a vacuum pump used to draw the gas stream from the chamber, the gas stream is conveyed to a gas mixing chamber, to which a reactant is supplied for reacting with one of the gaseous precursors to form solid material. The gas stream is then conveyed to a cyclone separator to separate solid material from the gas stream. By deliberately reacting a non-reacted precursor to form solid material upstream from the pump, reaction within the pump of the non-reacted precursor and a second non-reacted precursor subsequently drawn from the chamber by the pump can be inhibited.