Patents by Inventor Michael Anthony Purvis

Michael Anthony Purvis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEM FOR MONITORING A PLASMA
    Publication number: 20220151052
    Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
    Type: Application
    Filed: January 25, 2022
    Publication date: May 12, 2022
    Inventors: Michael Anthony Purvis, Klaus Martin Hummler, Chengyuan Ding, Robert Jay Rafac, Igor Vladimirovich Fomenkov
  • System for monitoring a plasma
    Patent number: 11266002
    Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
    Type: Grant
    Filed: October 19, 2018
    Date of Patent: March 1, 2022
    Assignee: ASML Netherlands B.V.
    Inventors: Michael Anthony Purvis, Klaus Martin Hummler, Chengyuan Ding, Robert Jay Rafac, Igor Vladimirovich Fomenkov
  • SYSTEM FOR MONITORING A PLASMA
    Publication number: 20200344868
    Abstract: An amplified optical beam is provided to a region that receives a target including target material, an interaction between the amplified optical beam and the target converting at least some of the target material from a first form to a second form to form a light-emitting plasma; first data comprising information related to the amplified optical beam is accessed; second data comprising information related to the light-emitting plasma is accessed; and an amount of the target material converted from the first form to the second form is determined. The determination is based on at least the first data and the second data, and the second form of the target material is less dense than the first form of the target material.
    Type: Application
    Filed: October 19, 2018
    Publication date: October 29, 2020
    Inventors: Michael Anthony Purvis, Klaus Martin Hummler, Chengyuan Ding, Robert Jay Rafac, Igor Vladimirovich Fomenkov