Patents by Inventor Michael B. Swope

Michael B. Swope has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Non-covalently crosslinkable materials for photolithography processes
    Patent number: 9482951
    Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
    Type: Grant
    Filed: July 28, 2008
    Date of Patent: November 1, 2016
    Assignee: Brewer Science Inc.
    Inventors: Daniel M. Sullivan, Runhui Huang, Charles J. Neef, Jinhua Dai, Michael B. Swope
  • NON-COVALENTLY CROSSLINKABLE MATERIALS FOR PHOTOLITHOGRAPHY PROCESSES
    Publication number: 20090035590
    Abstract: This invention describes compositions and methods of using non-covalently crosslinked resin coatings for lithographic applications. These materials are designed to undergo, after coating, a change that provides solvent resistance and, with some materials, simultaneous aqueous-base solubility. Non-covalent interactions allow for easier removal of these coatings than of covalently crosslinked materials. These types of materials are well-suited for trench and gap fill applications, as well as for anti-reflective coatings, spin-on carbon layers, and etch masks.
    Type: Application
    Filed: July 28, 2008
    Publication date: February 5, 2009
    Inventors: Daniel M. Sullivan, Runhui Huang, Charles J. Neef, Jinhua Dai, Michael B. Swope