Patents by Inventor Michael Biese

Michael Biese has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8205352
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Grant
    Filed: July 13, 2011
    Date of Patent: June 26, 2012
    Assignee: Applied Materials, Inc.
    Inventors: John S. Lewis, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling
  • Publication number: 20110266736
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Application
    Filed: July 13, 2011
    Publication date: November 3, 2011
    Inventors: JOHN S. LEWIS, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling
  • Patent number: 7980000
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Grant
    Filed: October 21, 2008
    Date of Patent: July 19, 2011
    Assignee: Applied Materials, Inc.
    Inventors: John S. Lewis, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling
  • Publication number: 20090084413
    Abstract: Embodiments of the present invention generally relate to an apparatus and methods for rinsing and drying substrates. One embodiment provides an end effector comprising a body having a contact tip for contacting an edge area of a substrate, wherein the end effector is configured to support the substrate while the substrate is in a rinsing bath and while the substrate is being dried from the rinsing bath, and the contact tip comprises a hydrophilic material.
    Type: Application
    Filed: October 21, 2008
    Publication date: April 2, 2009
    Inventors: JOHN S. LEWIS, Michael Biese, Garrett H. Sin, Chidambara A. Ramalingam, Balaji Chandrasekaran, Tak Fan (Kerry) Ling