Abstract: A method where one or more objects of a three-dimensional scene are determined in accordance with provided raw data of the three-dimensional scene representing a predefined environment inside and/or outside the vehicle. A two-dimensional image is determined in accordance with the provided raw data of the three-dimensional scene such that the two-dimensional image depicts the determined objects of the three-dimensional scene on a curved plane. The two-dimensional image has a quantity of pixels, each representing at least one part or several of the determined objects of the three-dimensional scene. Data is provided which represents at least one determined field of view of the driver. For at least one of the determined objects, the probability with which the at least one object will be located in the field of view of the driver is determined in accordance with the provided data and the two-dimensional image.

Abstract: Methods and systems by which an identifier of a social event, attendee recognition data, and an image of an attendee are obtained. In some variants a portion of image data associated with the attendee recognition data is sent to a mobile client device in response both to a recipient authorization and to an image data selection identifying the portion of the image data.

Abstract: In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion. The energy input for each individual step is determined as a function of the shape of the polyline ascertained from several preceding individual steps. Also described is a corresponding apparatus with which, using electron beam lithography, it is possible to form polylines with a very uniform line width. The method and apparatus are particularly suitable for writing curved polylines.

Abstract: The invention refers to the field of electron beam lithography, in particular to a method for directing an electron beam (6) onto a target position (Z) on the surface of a substrate, the substrate first being placed onto a movable stage (2) and the stage (2) then being displaced stepwise, in the X and/or Y coordinates of a Cartesian grid, until the target position (Z) is located at a spacing from the impact point (P) of the undeflected electron beam (6) which is smaller than the smallest step distance of the stage displacement system, and then the electron beam (6) is directed onto the target position (Z) by deflection. This results in a considerable increase in positioning accuracy in electron beam lithography. Positioning accuracies on the order of 0.1 nm to 0.05 are achievable. The method is suitable in particular for writing grating patterns in which the spacing between the individual grating lines must be maintained with high accuracy.

Abstract: In a method for forming, with the aid of an electron beam (6), a polyline on a substrate (4) coated with a radiation-sensitive resist, the electron beam (6) is directed onto a surface of the substrate (4) in the direction of a Z coordinate, and the substrate (4) is displaced relative to the electron beam (6) in an X-Y plane in individual steps. After each individual step of the displacement, the electron beam (6) acts with a predefined energy input on the substrate (4) during a halt in the displacement motion.

Abstract: The invention refers to the field of electron beam lithography, in particular to a method for directing an electron beam (6) onto a target position (Z) on the surface of a substrate, the substrate first being placed onto a movable stage (2) and the stage (2) then being displaced stepwise, in the X and/or Y coordinates of a Cartesian grid, until the target position (Z) is located at a spacing from the impact point (P) of the undeflected electron beam (6) which is smaller than the smallest step distance of the stage displacement system, and then the electron beam (6) is directed onto the target position (Z) by deflection.

Abstract: A process for controlling the operation of a printing head detects defects in the transport of the printing head along a printed line and if necessary corrects them. A control unit (24) controls a current source (16) which supplies current to a transport motor (12) which moves the printing head (10). The printing elements (14) of the printing head (10) are supplied with pulsed drive current (ID) by a driver component (18). A position indicator (20) records the distance travelled by the printing head (10) along a printed line. According to the invention, the transport time between two printing positions is monitored to detect whether a limit value (G) is exceeded. If the limit value (G) is exceeded, the drive of the printing head (10) is stopped and if necessary the printing head is moved in the opposite direction and/or at least one printing element (14, 15) is operated with less energy that that required for printing.