Abstract: An alternating phase-shifting mask (Alt-PSM) comprising a 0° phase portion having a first width and a 180° phase portion having a second width greater than the first width. Example differences between the width of the 180° phase portion and the 0° phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.

Abstract: An alternating phase-shifting mask (Alt-PSM) comprising a 0° phase portion having a first width and a 180° phase portion having a second width greater than the first width. Example differences between the width of the 180° phase portion and the 0° phase portion may be 10 nm, 15 nm, or 20 nm. An Alt-PSM having phase portions of different widths can have an aerial image intensity transmission graph that is symmetric, for example, at 0.2-0.3 intensity.

Abstract: A retention device comprising at least one main body member and one or more anchoring members. The main body member may comprise a plurality of retainer loops, which may traverse along a longitudinal axis of the main body member and may be adapted to retain one or more objects. The anchoring members may comprise at least a first anchoring member and a second anchoring member. The anchoring members may further comprise one or more shafts and one or more bases. The main body member may extend between the first anchoring member and the second anchoring member and may be removably coupled to the anchoring members. The plurality of retainer loops may be adapted to engage the shafts of the anchoring members. The bases of the anchoring members may be adapted to removably attach the anchoring members to a surface.