Patents by Inventor Michael Broers

Michael Broers has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Tunable light source
    Patent number: 11980773
    Abstract: An illuminated bassinet including a light source for delivering therapeutic light and anti-bacterial light, where an interlock prevents the anti-bacterial light from being emitted while an infant is located in the bassinet. Also, a surgical illuminator configured to concurrently or alternately emit different wavelengths of light for treating a physiological condition and for affecting perception of the surgical opening.
    Type: Grant
    Filed: September 12, 2022
    Date of Patent: May 14, 2024
    Inventors: Peter Broer, Vedang Kothari, Alan Greszler, Joseph Dombrowski, David Felty, Michael Kerns
  • Lithographic apparatus, system, method, computer program, and apparatus for height map analysis
    Patent number: 7012672
    Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.
    Type: Grant
    Filed: March 10, 2004
    Date of Patent: March 14, 2006
    Assignee: ASML Netherlands B.V.
    Inventors: Tasja Van Rhee, Thomas Josephus Maria Castenmiller, Willem Herman Gertruda Anna Koenen, Alex Van Zon, Michael Broers
  • Lithographic apparatus, system, method, computer program, and apparatus for height map analysis
    Publication number: 20040239905
    Abstract: A lithographic projection apparatus and method of manufacturing devices using such an apparatus is presented. The apparatus includes a level sensor to measure the height of a wafer in a plurality of points. The height info is sent to a processor which is arranged to create a measured height map using input from the level sensor. In one embodiment of the invention, the processor is also arranged to calculate an average die topology using the measured height map in order to produce a raw height map of the surface of the substrate, and to detect any focus spots on said surface of said substrate using the raw height map. By subtracting the average die topology, focus spots can be located more accurately than before.
    Type: Application
    Filed: March 10, 2004
    Publication date: December 2, 2004
    Applicant: ASML Netherlands B.V.
    Inventors: Tasja Van Rhee, Thomas Josephus Maria Castenmiller, Willem Herman Gertruda Anna Koenen, Alex Van Zon, Michael Broers