Patents by Inventor Michael C. Gifford

Michael C. Gifford has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Plasma reactor including helical electrodes
    Patent number: 7387081
    Abstract: A device for forming an ion sheath in a plasma to deposit coatings on a non-conducting substrate. The device comprises a tubular reaction chamber having an outer surface wound helically with a first electrode having a first width. Helical winding of the first electrode provides a plurality of first wraps around the outer surface of the tubular reaction chamber. The device further includes a second electrode having a second width that is larger than the first width. Helical winding of the second electrode provides a plurality of second wraps alternating with the first wraps around the outer surface of the tubular reaction chamber. An ion sheath in a plasma forms to a thickness extending at least to the longitudinal axis of the tubular reaction chamber when the first electrode has a connection to a source of radio-frequency power and the second electrode provides a path to ground.
    Type: Grant
    Filed: January 23, 2003
    Date of Patent: June 17, 2008
    Assignee: 3M Innovative Properties Company
    Inventors: Moses M. David, Michael C. Gifford
  • Plasma reactor including helical electrodes
    Publication number: 20040144314
    Abstract: A device for forming an ion sheath in a plasma to deposit coatings on a non-conducting substrate. The device comprises a tubular reaction chamber having an outer surface wound helically with a first electrode having a first width. Helical winding of the first electrode provides a plurality of first wraps around the outer surface of the tubular reaction chamber. The device further includes a second electrode having a second width that is larger than the first width. Helical winding of the second electrode provides a plurality of second wraps alternating with the first wraps around the outer surface of the tubular reaction chamber. An ion sheath in a plasma forms to a thickness extending at least to the longitudinal axis of the tubular reaction chamber when the first electrode has a connection to a source of radio-frequency power and the second electrode provides a path to ground.
    Type: Application
    Filed: January 23, 2003
    Publication date: July 29, 2004
    Applicant: 3M Innovative Properties Company
    Inventors: Moses M. David, Michael C. Gifford