Abstract: A coupling (30) for the introduction of a bias voltage into a vacuum chamber. The coupling consists of a metallic ball bearing assembly (36), a bearing sleeve or cup (34), and an EMI shielding gasket (42) seated within the bearing sleeve or cup. The ball bearing assembly is fitted within the EMI shielding gasket, about a metallic shaft (32) which, in turn, is coupled to a source of the bias voltage. The bearing sleeve or cup is, in turn, coupled to a rotating component such as a platen, for receiving the bias voltage within the vacuum chamber.

Abstract: A coupling (30) for the introduction of a bias voltage into a vacuum chamber. The coupling consists of a metallic ball bearing assembly (36), a bearing sleeve or cup (34), and an EMI shielding gasket (42) seated within the bearing sleeve or cup. The ball bearing assembly is fitted within the EMI shielding gasket, about a metallic shaft (32) which, in turn, is coupled to a source of the bias voltage. The bearing sleeve or cup is, in turn, coupled to a rotating component such as a platen, for receiving the bias voltage within the vacuum chamber.

Abstract: A method and apparatus for a rotatable anode of an x-ray tube. The anode having an axis of rotation and includes a solid thin plate target having a substantially planar base surface extending from the axis of rotation to a periphery outlining the base surface, wherein the plate target includes target material for generating x-rays selected from a group of high-Z materials. The plate target has a thickness of about 1 mm or less. The method includes fabricating the thin plate target using silicon wafer processing technology using suitable materials for such technology in forming the plate target selected from the group of high-Z materials.