Patents by Inventor Michael D. G. Steigerwald

Michael D. G. Steigerwald has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Electron-beam device and detector system
    Patent number: 7910887
    Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.
    Type: Grant
    Filed: February 27, 2009
    Date of Patent: March 22, 2011
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Michael D. G. Steigerwald, Dirk Preikszas, Volker Drexel
  • Electron-beam device and detector system
    Publication number: 20090309024
    Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.
    Type: Application
    Filed: February 27, 2009
    Publication date: December 17, 2009
    Inventors: MICHAEL D.G. STEIGERWALD, DIRK PREIKSZAS, VOLKER DREXEL
  • Electron-beam device and detector system
    Patent number: 7507962
    Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.
    Type: Grant
    Filed: November 8, 2006
    Date of Patent: March 24, 2009
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Michael D. G. Steigerwald, Dirk Preikszas, Volker Drexel
  • Electron-beam device and detector system
    Patent number: 7425701
    Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.
    Type: Grant
    Filed: January 13, 2004
    Date of Patent: September 16, 2008
    Assignee: Carl Zeiss NTS GmbH
    Inventors: Michael D. G. Steigerwald, Dirk Preikszas, Volker Drexel
  • Electron-beam device and detector system
    Publication number: 20040245465
    Abstract: An electron-beam device having a beam generator for generating an electron beam, an objective lens for focusing the electron beam on an object, and at least one detector for detecting electrons scattered on the object or emitted by the object. Furthermore, a detector system for detecting electrons is described. With an electron-beam device having a detector system according to the present invention, it is possible to make a selection in a simple manner, in particular according to backscattered and secondary electrons. At the same time, as many electrons as possible may be detected using the detector system. For this purpose, the electron-beam device exhibits at least one adjustable diaphragm which is allocated to the detector. The detector system exhibits a detector on which a reflector for reflecting electrons onto the detector is accommodated.
    Type: Application
    Filed: January 13, 2004
    Publication date: December 9, 2004
    Inventors: Michael D.G. Steigerwald, Dirk Preikszas