Abstract: A device includes: a first portion configured to be grasped by the hand of the user, and a second portion defining a reservoir containing a control material, wherein the control material contains a target analyte in a known or predetermined concentration. A method of verifying the accuracy of an analyte monitoring device includes receiving a fluid sample, identifying the fluid sample as a control solution, and analyzing the fluid sample.

Abstract: Various shaped abrasive particles are disclosed. Each shaped abrasive particle includes a body having at least one major surface and a side surface extending from the major surface.

Abstract: Systems and methods for parallel, discrete, simulations include functional capabilities to incorporate one or more human operators or actors into the simulation process. Such individuals can be presented situations where one or more decisions are necessary with respect to ongoing events. Entered decisions are incorporated into simulated events and activities being simulated. These in turn influence the behavior of those entities and also initiate the occurrence of other time-based processes. An architecture artifact or product can be automatically created or updated by recording how a sequence of events took place. The creation of sections of the DoDAF OV-6C Operational Event Trace architectural diagram, for the executable architecture model, can be automatically performed to dynamically provide event traces in response to a live exercise.

Abstract: In some embodiments, the present invention is directed to methods that involve the combination of step-and-flash imprint lithography (SFIL) with a multi-tier template to simultaneously pattern multiple levels of, for example, an integrated circuit device. In such embodiments, the imprinted material generally does not serve or act as a simple etch mask or photoresist, but rather serves as the insulation between levels and lines, i.e., as a functional dielectric material. After imprinting and a multiple step curing process, the imprinted pattern is filled with metal, as in dual damascene processing. Typically, the two printed levels will comprise a “via level,” which is used to make electrical contact with the previously patterned under-level, and a “wiring level.” The present invention provides for the direct patterning of functional materials, which represents a significant departure from the traditional approach to microelectronics manufacturing.

Abstract: A apparatus and method for effecting repair to damaged, nonstressed aircraft structure is described. A sheet of material comprised of woven glass cloth impregnated with a resin cured under temperature and pressure forms the basic patch. One side of the patch has a Tedlar.RTM. overlay attached to the sheet face in the preferred embodiment. This patch material meets the Federal Aviation Regulations (FAR 25.855) which is required to provide for fire resistant material on transport aircraft. A pressure sensitive film is bonded to the side opposite the Tedlar.RTM. overlay. This combination of glass sheet and pressure sensitive film is pressure bonded to the damaged structure and further held in place by mechanical fasteners which can withstand a temperature of at least 1,700 degrees Fahrenheit.One of the primary applications of this invention is in the cargo liner repair of transport aircraft.