Abstract: The invention relates to a method for producing a metal stamp for embossing a nano- or microstructure on a metal device (4), comprising the following steps for producing a 3D structured embossing area (3) on the stamp: a) providing a master (30) having a structured surface (30a), and replicating said master (30a) in the surface of a soft stamp (31); b) forming an imprint (32) on the soft stamp (31a) using a cross-linkable material to form an imprint structured surface (32a), before, while or after contacting an opposite side of the imprint (32) with said surface portion of the metal stamp, and removing said soft-stamp (31) exposing said imprint structured surface (32a); c) etch-opening said surface (32a) using a first set of etching conditions; d) using a second set of etching conditions, different from the first ones, etching the surface of the metal stamp to form said embossing area (3).

Abstract: The invention relates to a device (4) in the form of a medical prosthesis (9, 17), medical osteosynthesis device, hearing aid or hearing aid housing, essentially made of metal, wherein the device (4, 9, 17) comprises at least one optical diffractive element with a grating (6) which is directly embossed in an exposed metal surface in the form of a security and/or identification element. The invention furthermore relates to methods for making such devices and to uses of such devices.

Abstract: A dental implant having a surface made of a ceramic material. The dental implant is characterized in that the surface has a topography defined by a Core Roughness Depth Sk of less than 1 ?m.

Abstract: Dental implant system having an anchoring part adapted for anchoring the dental implant system within bone, said anchoring part having a bone contacting surface. The bone contacting surface is at least partially made of a metal selected from the group of niobium, tantalum and a niobium-tantalum alloy. Said metal is coated on a basic implant body made of a metal selected from the group of titanium, zirconium and a titanium or zirconium alloy, or of a ceramic material.

Abstract: A dental implant having a surface made of a ceramic material. The dental implant is characterized in that the surface has a topography defined by a Core Roughness Depth Sk of less than 1 ?m.

Abstract: The invention refers, among others, to a PVD method for the coating of elements made of titanium or titanium alloy to prevent cold welding. This method includes at least the following steps: a) positioning the elements in a recipient, b) application of a vacuum, c) deposition of a first metal or a first metal alloy in nitrogen and acetylene atmosphere, d) deposition of a second metal or a second metal alloy in nitrogen and acetylene atmosphere, e) repetition of steps c) and d) until a sufficient layer thickness is achieved, f) ventilation of the recipient, g) removal of the elements from the recipient, h) purification of the elements with a suitable cleansing bath.

Abstract: The present invention relates to an implant (1) with at least partially a roughened surface (2), which is at least partially covered by an organic or polymeric intermediate layer (3) and attached thereto a top layer (4). The top layer (4) provides for a controlled release of at least one bioactive agent. A kit for preparing such an implant is also described.

Abstract: This invention relates to the controlled two-dimensional structural transition of a dipole monolayer at a metal, semi-conducting or insulating interface. The dipole monolayer consists of objects/molecules with a permanent electric dipole moment. A transition between the structures of the molecular layer can be performed locally and reversibly by applying an electrical field and the structures/patterns can be reversibly switched many times between two different structures/states. Both of the two structures, the ordered and the disordered structures, are intrinsically stable without the presence of the switching electrical field. This controlled switch of the local layer structure can be used to change layer properties (i.e., mechanical, electrical, optical properties). The controlled reversible modifications of the dipole monolayer structures are usable as bit assignments in data storage applications for example.

Abstract: This invention relates to the controlled two-dimensional structural transition of a dipole monolayer at a metal, semi-conducting or insulating interface. The dipole monolayer consists of objects/molecules with a permanent electric dipole moment. A transition between the structures of the molecular layer can be performed locally and reversibly by applying an electrical field and the structures/patterns can be reversibly switched many times between two different structures/states. Both of the two structures, the ordered and the disordered structures, are intrinsically stable without the presence of the switching electrical field. This controlled switch of the local layer structure can be used to change layer properties (i.e., mechanical, electrical, optical properties). The controlled reversible modifications of the dipole monolayer structures are usable as bit assignments in data storage applications for example.