Abstract: A movable capacitive sensing component and plural stationary capacitive sensing components are similarly constructed and are located together. The movable capacitive sensing component includes two interdigitated electrode elements at least one of which moves in accordance with displacement of an object. The stationary capacitive sensing components includes two interdigitated electrode elements that do not move, and differ from each other in terms of relative displacement between the fixed electrode elements. The movable capacitive sensing component measures a capacitance value. Another capacitance value is estimated, from the capacitance values measured by the stationary capacitive sensing components, for the displacement indicated by the movable capacitive sensing component's measured capacitance value.

Abstract: A MEMS type actuator includes a substrate defining a plane; a micro bellows disposed on the substrate and operable to expand in a direction out of a substrate plane, the substrate having an opening therein for fluid flow to the micro bellows; and a ramp disposed above the micro bellows. In a collapsed position of the micro bellows, the ramp is substantially parallel to the plane of the substrate and, in expanded positions of the micro bellows, the micro bellows applies a force to the ramp thereby causing rotation of the ramp in a direction out of the substrate plane.

Abstract: A system for protecting a diaphragm of a microelectromechanical systems (MEMS) device includes a housing coupled to the MEMS device such that its sensing diaphragm is surrounded thereby. A perforated barrier in the housing is adjacent to the sensing diaphragm. A protection diaphragm in the housing has its first side exposed to an external environment of interest, and has its second side facing the perforated barrier and spaced apart therefrom. A fluid is disposed contiguously between the second side of the protection diaphragm and the sensing diaphragm.

Abstract: To fabricate high aspect ratio metal structures, a two-layer structure is provided on a conductive layer. The two-layer structure includes a first layer adjacent the conductive layer and a second layer adjacent the first layer where the second layer is etchable by a Deep Reactive Ion Etching (DRIE) process. Using the DRIE process, at least one selected region of the second layer is completely etched away with the selected region being at least partially aligned with a region of the conductive layer such that the first layer is then exposed thereover. The first layer so-exposed is then removed to expose the region of the conductive layer thereunder. Metal is electroplated onto the exposed conductive layer and any remaining portions of the two-layer structure are then removed.

Abstract: An electrical generator includes a fluid-flow driven impeller including at least one impact arm; and at least one cantilevered beam disposed such that the impact arm strikes the cantilevered beam as the impeller rotates. The cantilevered beam at least partially includes a piezoelectric film.

Abstract: A projectile includes a projectile body including a flow surface; the flow surface including at least one control surface formed therein. The controls surface is formed continuous with the flow surface, and a pressure source is connected to at least one control surface. The pressure source delivers a pressure to at least one control surface to cause at least one control surface to bulge away from the flow surface.