Patents by Inventor Michael Dennis Feit

Michael Dennis Feit has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and method for deterministic control of surface figure during full aperture polishing
    Patent number: 8588956
    Abstract: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
    Type: Grant
    Filed: January 28, 2010
    Date of Patent: November 19, 2013
    Inventors: Tayyab Ishaq Suratwala, Michael Dennis Feit, William Augustus Steele
  • Methods for globally treating silica optics to reduce optical damage
    Patent number: 8313662
    Abstract: A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.
    Type: Grant
    Filed: October 1, 2009
    Date of Patent: November 20, 2012
    Assignee: Lawrence Livermore National Security, LLC
    Inventors: Philip Edward Miller, Tayyab Ishaq Suratwala, Jeffrey Devin Bude, Nan Shen, William Augustus Steele, Ted Alfred Laurence, Michael Dennis Feit, Lana Louie Wong
  • METHODS FOR GLOBALLY TREATING SILICA OPTICS TO REDUCE OPTICAL DAMAGE
    Publication number: 20110079931
    Abstract: A method for preventing damage caused by high intensity light sources to optical components includes annealing the optical component for a predetermined period. Another method includes etching the optical component in an etchant including fluoride and bi-fluoride ions. The method also includes ultrasonically agitating the etching solution during the process followed by rinsing of the optical component in a rinse bath.
    Type: Application
    Filed: October 1, 2009
    Publication date: April 7, 2011
    Applicant: Lawrence Livermore National Security, LLC
    Inventors: Philip Edward Miller, Tayyab Ishaq Suratwala, Jeffrey Devin Bude, Nan Shen, William Augustus Steele, Ted Alfred Laurence, Michael Dennis Feit, Lana Louie Wong
  • Apparatus and Method for Deterministic Control of Surface Figure During Full Aperture Polishing
    Publication number: 20100311308
    Abstract: A polishing system configured to polish a lap includes a lap configured to contact a workpiece for polishing the workpiece; and a septum configured to contact the lap. The septum has an aperture formed therein. The radius of the aperture and radius the workpiece are substantially the same. The aperture and the workpiece have centers disposed at substantially the same radial distance from a center of the lap. The aperture is disposed along a first radial direction from the center of the lap, and the workpiece is disposed along a second radial direction from the center of the lap. The first and second radial directions may be opposite directions.
    Type: Application
    Filed: January 28, 2010
    Publication date: December 9, 2010
    Applicant: Lawrence Livermore National Security, LLC
    Inventors: Tayyab Ishaq Suratwala, Michael Dennis Feit, William Augustus Steele