Patents by Inventor Michael Deyerler

Michael Deyerler has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7909818
    Abstract: A jointed mirror arm includes at least two tubular pieces, connected to each other by a joint with a reflecting mirror, which, as a result of the joint, may be arranged in varying configurations and which form a beam path for the radiation, with a fixed inlet on a first tube piece for the introduction of radiation from a stationary optical source and a position different from the position of the inlet for the outlet from the intermediate joint arm on a final tube piece for emitting said radiation. The jointed mirror arm is characterized in that a scanner for the radiation is arranged before the inlet into the intermediate jointed arm and an optical imaging system is provided in the at least two tube pieces of the intermediate jointed arm, for imaging the scanner after the output from the intermediate jointed arm.
    Type: Grant
    Filed: April 15, 2005
    Date of Patent: March 22, 2011
    Assignee: Linos Photonics GmbH & Co. KG
    Inventor: Michael Deyerler
  • Publication number: 20070035794
    Abstract: A jointed mirror arm includes at least two tubular pieces, connected to each other by a joint with a reflecting mirror, which, as a result of the joint, may be arranged in varying configurations and which form a beam path for the radiation, with a fixed inlet on a first tube piece for the introduction of radiation from a stationary optical source and a position different from the position of the inlet for the outlet from the intermediate joint arm on a final tube piece for emitting said radiation. The jointed mirror arm is characterized in that a scanner for the radiation is arranged before the inlet into the intermediate jointed arm and an optical imaging system is provided in the at least two tube pieces of the intermediate jointed arm, for imaging the scanner after the output from the intermediate jointed arm.
    Type: Application
    Filed: April 15, 2005
    Publication date: February 15, 2007
    Inventor: Michael Deyerler
  • Publication number: 20070010804
    Abstract: An ophthalmological apparatus (1) comprises a base station (11) having a light source (51) for generating light pulses, and an application head (3) which can be mounted on an eye (2) having a light projector (58) for the focussed projection of the light pulses for punctiform breakdown of eye tissue (22). The application head (3) additionally has movement drivers (57) for moving the light projector (58) in a feed direction and in a first scanning direction. A scanner (52) is arranged in the base station (11) in order to deflect the light pulses in a second scanning direction. In addition, the ophthalmological apparatus (1) comprises an optical transmission system for transmitting deflected light pulses from the base station (11) to the application head (3), and for superimposing the light pulses deflected in the second scanning direction onto the movement of the light projector (58) in the first scanning direction.
    Type: Application
    Filed: June 9, 2006
    Publication date: January 11, 2007
    Applicant: SIE AG Surgical Instrument Engineering
    Inventors: Christian Rathjen, Wolfgang Zesch, Michael Deyerler, Holger Lubatschowski, Tammo Ripken
  • Patent number: 5825565
    Abstract: In order to produce lightweight mirror structures or other reflecting components, preformed silicon elements of sufficient wall thickness are applied to a CFC or CMC substrate structure with the dimensions of the component to be produced, at a temperature in the range 1300.degree. C. and 1600.degree. C. either in vacuum or in a protective atmosphere. In this way a mirror structure or reflector is formed directly. It is possible to work at temperatures in the range of 300.degree. C. to 600.degree. C. when the silicon is applied in the form of a preform such as a wafer, which is joined to the substrate by way of a zone of a melt eutectic incorporating a nonferrous metal, which is preferably gold. The surfaces are subsequently coated.
    Type: Grant
    Filed: May 24, 1996
    Date of Patent: October 20, 1998
    Assignees: Industrieanlagen-Betriebsgesellschaft GmbH, Daimler-Benz Aerospace AG
    Inventors: Ulrich Papenburg, Ernst Blenninger, Peter Goedtke, Michael Deyerler
  • Patent number: 5565052
    Abstract: In order to produce lightweight mirror structures or other reflecting components, preformed silicon elements of sufficient wall thickness are applied to a CFC or CMC substrate structure with the dimensions of the component to be produced, at a temperature in the range 1300.degree. C. and 1600.degree. C. either in vacuum or in a protective atmosphere. In this way a mirror structure or reflector is formed directly. It is possible to work at temperatures in the range of 300.degree. C. to 600.degree. C. when the silicon is applied in the form of a preform such as a wafer, which is joined to the substrate by way of a zone of a melt eutectic incorporating a nonferrous metal, which is preferably gold. The surfaces are subsequently coated.
    Type: Grant
    Filed: September 2, 1994
    Date of Patent: October 15, 1996
    Assignees: Industrieanlagen-Betriebsgesellschaft GmbH, Daimler-Benz Aerospace AG
    Inventors: Ulrich Papenburg, Ernst Blenninger, Peter Goedtke, Michael Deyerler